⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21215437 | 0.77 | — | — | |
| SCHEMBL858269 | 0.65 | — | — | |
| SCHEMBL1130260 | 0.65 | — | — | |
| SCHEMBL18694999 | 0.65 | — | — | |
| SCHEMBL24425413 | 0.65 | — | — | |
| SCHEMBL24425415 | 0.65 | — | — | |
| SCHEMBL3320271 | 0.65 | — | — | |
| SCHEMBL4397151 | 0.64 | — | — | |
| SCHEMBL10239380 | 0.60 | — | — | |
| SCHEMBL21788151 | 0.58 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-5171188-A | — | — | None | — | — | JP | disclosed |
| CN-111816559-B | Chemical for TSV/MEMS/power device etching | 乔治洛德方法研究和开发液化空气有限公司 | 2024-06-11 | — | — | CN | disclosed |
| EP-3898878-A1 | AZEOTROPE OR AZEOTROPE-LIKE COMPOSITIONS OF 1,2,2-TRIFLUORO-1-TRIFLUOROMETHYLCYCLOBUTANE (TFMCB) AND APPLICATIONS THEREOF | Honeywell International Inc. (US) | 2021-10-27 | — | — | EP | disclosed |
| CN-111816559-A | Chemistry for TSV/MEMS/power device etching | 乔治洛德方法研究和开发液化空气有限公司 | 2020-10-23 | — | — | CN | disclosed |
| CN-106663624-B | Chemistry for TSV/MEMS/power device etching | 乔治洛德方法研究和开发液化空气有限公司 | 2020-08-14 | — | — | CN | disclosed |
| US-10720335-B2 | Chemistries for TSV/MEMS/power device etching | AMERICAN AIR LIQUIDE, INC. (US) | 2020-07-21 | — | — | US | disclosed |
| WO-2020132307-A1 | AZEOTROPE OR AZEOTROPE-LIKE COMPOSITIONS OF 1,2,2-TRIFLUORO-1-TRIFLUOROMETHYLCYCLOBUTANE (TFMCB) AND APPLICATIONS THEREOF | HONEYWELL INTERNATIONAL INC. (US) | 2020-06-25 | — | — | WO | disclosed |
| EP-3538503-A1 | A PROCESS FOR THE PRODUCTION OF FLUORINATED CYCLOBUTANE | Honeywell International Inc. (US) | 2019-09-18 | — | — | EP | disclosed |
| US-20180366336-A1 | CHEMISTRIES FOR TSV/MEMS/POWER DEVICE ETCHING | AIR LIQUIDE AMERICAN (US) | 2018-12-20 | — | — | US | disclosed |
| US-10103031-B2 | Chemistries for TSV/MEMS/power device etching | L'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Georges Claude (FR) | 2018-10-16 | — | — | US | disclosed |
| WO-2018089362-A1 | A PROCESS FOR THE PRODUCTION OF FLUORINATED CYCLOBUTANE | HONEYWELL INTERNATIONAL INC. (US) | 2018-05-17 | — | — | WO | disclosed |
| US-20180076046-A1 | CHEMISTRIES FOR TSV/MEMS/POWER DEVICE ETCHING | AIR LIQUIDE AMERICAN (US) | 2018-03-15 | — | — | US | disclosed |
| US-9892932-B2 | Chemistries for TSV/MEMS/power device etching | L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude (FR) | 2018-02-13 | — | — | US | disclosed |
| EP-3158579-A1 | CHEMISTRIES FOR TSV/MEMS/POWER DEVICE ETCHING | L'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude (FR) | 2017-04-26 | — | — | EP | disclosed |
| US-20170103901-A1 | CHEMISTRIES FOR TSV/MEMS/POWER DEVICE ETCHING | AMERICAN AIR LIQUIDE, INC. (US) | 2017-04-13 | — | — | US | disclosed |
| JP-H05171188-A | COMPOSITION USED FOR CLEANING | ASAHI GLASS CO LTD | 1993-07-09 | — | — | JP | disclosed |