Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.31 |
| ▸ | ABCB11 | O95342 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.31 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.31 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.31 |
| ▸ | CHRM5 | P08912 | 1/20 | 0.31 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.31 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.31 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.31 |
| ▸ | DRD1 | P21728 | 1/20 | 0.31 |
| ▸ | HRH2 | P25021 | 1/20 | 0.31 |
| ▸ | HTR2A | P28223 | 1/20 | 0.31 |
| ▸ | HTR2C | P28335 | 1/20 | 0.31 |
| ▸ | HRH1 | P35367 | 1/20 | 0.31 |
| ▸ | DRD3 | P35462 | 1/20 | 0.31 |
| ▸ | SCN1A | P35498 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9893522 | 1.00 | ALDH1A1 (0.34) | ALDH1A1CYP3A4ABCB11LMNACYP1A2 | |
| SCHEMBL4824444 | 0.98 | CYP3A4 (0.33) | ALDH1A1CYP3A4ABCB11LMNACYP1A2 | |
| SCHEMBL4856836 | 0.98 | CYP3A4 (0.33) | ALDH1A1CYP3A4ABCB11LMNACYP1A2 | |
| SCHEMBL10417245 | 0.98 | CYP3A4 (0.33) | ALDH1A1CYP3A4ABCB11LMNACYP1A2 | |
| SCHEMBL7920362 | 0.98 | ALDH1A1 (0.33) | ALDH1A1CYP3A4ABCB11LMNACYP1A2 | |
| SCHEMBL23494272 | 0.95 | ALDH1A1 (0.35) | ALDH1A1 | |
| SCHEMBL21027180 | 0.95 | ALDH1A1 (0.35) | ALDH1A1 | |
| SCHEMBL18068623 | 0.90 | ALDH1A1 (0.31) | ALDH1A1 | |
| SCHEMBL18068624 | 0.89 | CYP3A4 (0.31) | CYP3A4ABCB11LMNACYP1A2CHRM2 | |
| SCHEMBL18068626 | 0.89 | CYP3A4 (0.31) | CYP3A4ABCB11LMNACYP1A2CHRM2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230305398-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| CN-115704995-A | Curable composition, cured film and application thereof, method for producing cured film, and polymer | JSR株式会社 | 2023-02-17 | — | — | CN | disclosed |
| CN-114450369-A | Adhesive sheet | 王子控股株式会社 | 2022-05-06 | — | — | CN | disclosed |
| US-20200325361-A1 | Temperature-Changeable Adhesive Sheet and Temperature-Changeable Adhesive Sheet Manufacturing Method Using Same | LG CHEM, LTD. (KR) | 2020-10-15 | — | — | US | disclosed |
| US-20130289210-A1 | PRESSURE-SENSITIVE ADHESIVE COMPOSITION AND PRESSURE-SENSITIVE ADHESIVE SHEET | NITTO DENKO CORPORATION (JP) | 2013-10-31 | — | — | US | disclosed |
| US-20120328864-A1 | OPTICAL DOUBLE-SIDED PRESSURE-SENSITIVE ADHESIVE SHEET | NITTO DENKO CORPORATION (JP) | 2012-12-27 | — | — | US | disclosed |
| EP-2537903-A2 | Optical double-sided pressure-sensitive adhesive sheet | NITTO DENKO CORPORATION (JP) | 2012-12-26 | — | — | EP | disclosed |
| US-8168366-B2 | Low activation energy photoresist composition and process for its use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-05-01 | — | — | US | disclosed |
| US-8168366-B2 | Low activation energy photoresist composition and process for its use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-05-01 | — | — | US | disclosed |
| US-8168366-B2 | Low activation energy photoresist composition and process for its use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-05-01 | — | — | US | disclosed |
| US-20110008727-A1 | Low Activation Energy Photoresist Composition and Process for Its Use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-01-13 | — | — | US | disclosed |
| US-20110008727-A1 | Low Activation Energy Photoresist Composition and Process for Its Use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-01-13 | — | — | US | disclosed |
| US-7476492-B2 | Low activation energy photoresist composition and process for its use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-01-13 | — | — | US | disclosed |
| US-7476492-B2 | Low activation energy photoresist composition and process for its use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-01-13 | — | — | US | disclosed |
| US-7476492-B2 | Low activation energy photoresist composition and process for its use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-01-13 | — | — | US | disclosed |
| US-20070275324-A1 | Low activation energy photoresist composition and process for its use | GLOBALFOUNDRIES U.S. INC. | 2007-11-29 | — | — | US | disclosed |
| US-20070275324-A1 | Low activation energy photoresist composition and process for its use | GLOBALFOUNDRIES U.S. INC. | 2007-11-29 | — | — | US | disclosed |
| US-20070275324-A1 | Low activation energy photoresist composition and process for its use | GLOBALFOUNDRIES U.S. INC. | 2007-11-29 | — | — | US | disclosed |
| US-20070264592-A1 | Resist polymer, preparing method, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-11-15 | — | — | US | disclosed |
| US-20070264592-A1 | Resist polymer, preparing method, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-11-15 | — | — | US | disclosed |