SCHEMBL9562349

SCHEMBL9562349

O=C(O)c1cc2ccccc2cc1O.O=C(O)c1ccc2cc(O)ccc2c1

nearest known ligand 0.73

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 4/20 0.57
KMT2A Q03164 4/20 0.57
NPC1 O15118 1/20 0.57
RAB9A P51151 1/20 0.57
CLK1 P49759 1/20 0.53
DYRK1A Q13627 1/20 0.53
DYRK1B Q9Y463 1/20 0.53
PTPN11 Q06124 1/20 0.52
ACMSD Q8TDX5 1/20 0.50
GRIN2D O15399 1/20 0.49
GRIN2A Q12879 1/20 0.49
GRIN2B Q13224 1/20 0.49
GRIN2C Q14957 1/20 0.49
PTPN1 P18031 1/20 0.49
CA12 O43570 3/20 0.49
CA1 P00915 3/20 0.49
CA2 P00918 3/20 0.49
CA9 Q16790 3/20 0.49
CA7 P43166 2/20 0.49
CA14 Q9ULX7 2/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Beta-Naphtoic Acid SCHEMBL28760957 0.87 MEN1 (0.68) MEN1KMT2ANPC1RAB9ACLK1
Beta-Naphtoic Acid SCHEMBL27544270 0.87 MEN1 (0.68) MEN1KMT2ANPC1RAB9ACLK1
SCHEMBL30570062 0.87 LCK (0.53) PTPN11ACMSDGRIN2DGRIN2AGRIN2B
SCHEMBL1165653 0.87 LCK (0.53) PTPN11ACMSDGRIN2DGRIN2AGRIN2B
SCHEMBL5541003 0.87 LCK (0.53) PTPN11ACMSDGRIN2DGRIN2AGRIN2B
SCHEMBL29812614 0.87 LCK (0.53) PTPN11ACMSDGRIN2DGRIN2AGRIN2B
Hydrochloric Acid SCHEMBL3924510 0.85 LCK (0.52) PTPN11ACMSDGRIN2DGRIN2AGRIN2B
SCHEMBL7182303 0.85 LCK (0.52) PTPN11ACMSDGRIN2DGRIN2AGRIN2B
Potassium SCHEMBL7182313 0.85 LCK (0.52) PTPN11ACMSDGRIN2DGRIN2AGRIN2B
SCHEMBL29434908 0.85 CA12 (0.61) MEN1KMT2ANPC1RAB9AACMSD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230266675-A1 INSPECTION METHOD, METHOD FOR PRODUCING COMPOSITION, AND METHOD FOR VERIFYING COMPOSITION FUJIFILM CORPORATION (JP) 2023-08-24 US disclosed
CN-104428379-B Light sensitivity, the bottom anti-reflective coating material for dissolving in developer BREWER SCIENCE INC. (US) 2019-11-01 CN disclosed
US-10331032-B2 Photosensitive, developer-soluble bottom anti-reflective coating material BREWER SCIENCE, INC. (US) 2019-06-25 US disclosed
EP-2841513-B1 PHOTOSENSITIVE, DEVELOPER-SOLUBLE BOTTOM ANTI-REFLECTIVE COATING MATERIAL BREWER SCIENCE INC (US) 2018-02-14 EP disclosed
CN-104428379-A Photosensitive, developer-soluble bottom anti-reflective coating material BREWER SCIENCE INC 2015-03-18 CN disclosed
EP-2841513-A1 PHOTOSENSITIVE, DEVELOPER-SOLUBLE BOTTOM ANTI-REFLECTIVE COATING MATERIAL Brewer Science, Inc. (US) 2015-03-04 EP disclosed
WO-2013163100-A1 PHOTOSENSITIVE, DEVELOPER-SOLUBLE BOTTOM ANTI-REFLECTIVE COATING MATERIAL BREWER SCIENCE INC. (US) 2013-10-31 WO disclosed
US-20130280656-A1 PHOTOSENSITIVE, DEVELOPER-SOLUBLE BOTTOM ANTI-REFLECTIVE COATING MATERIAL BREWER SCIENCE INC. (US) 2013-10-24 US disclosed
EP-0524419-A1 Heat-sensitive recording materials and phenol compounds MITSUI TOATSU CHEMICALS, Inc. (JP) 1993-01-27 EP disclosed