Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 1/20 | 0.76 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.76 |
| ▸ | ACHE | P22303 | 4/20 | 0.74 |
| ▸ | CA12 | O43570 | 2/20 | 0.48 |
| ▸ | CA2 | P00918 | 2/20 | 0.48 |
| ▸ | CA9 | Q16790 | 2/20 | 0.48 |
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.48 |
| ▸ | LMNA | P02545 | 2/20 | 0.48 |
| ▸ | TSHR | P16473 | 2/20 | 0.48 |
| ▸ | CA1 | P00915 | 1/20 | 0.48 |
| ▸ | GLA | P06280 | 1/20 | 0.48 |
| ▸ | CA3 | P07451 | 1/20 | 0.48 |
| ▸ | CA4 | P22748 | 1/20 | 0.48 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.48 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.48 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.46 |
| ▸ | CA5A | P35218 | 1/20 | 0.46 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.46 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| P-Cresol SCHEMBL30606768 | 0.96 | ACHE (0.81) | CYP1A2CYP2C19ACHECA12CA2 | |
| P-Cresol SCHEMBL5509205 | 0.96 | ACHE (0.81) | CYP1A2CYP2C19ACHECA12CA2 | |
| P-Cresol SCHEMBL8517161 | 0.94 | CYP1A2 (0.69) | CYP1A2CYP2C19ACHECA12CA2 | |
| Metacresol SCHEMBL11749131 | 0.93 | ACHE (0.85) | CYP1A2CYP2C19ACHECA12CA2 | |
| Metacresol SCHEMBL8390202 | 0.93 | ACHE (0.85) | CYP1A2CYP2C19ACHECA12CA2 | |
| Metacresol SCHEMBL2535890 | 0.93 | ACHE (0.85) | CYP1A2CYP2C19ACHECA12CA2 | |
| Metacresol SCHEMBL27893633 | 0.93 | ACHE (0.85) | CYP1A2CYP2C19ACHECA12CA2 | |
| Metacresol SCHEMBL7619164 | 0.91 | ACHE (0.81) | CYP1A2CYP2C19ACHECA12CA2 | |
| Metacresol SCHEMBL28155447 | 0.91 | ACHE (0.90) | CYP1A2CYP2C19ACHECA12CA2 | |
| P-Cresol SCHEMBL8640938 | 0.89 | ACHE (0.71) | CYP1A2CYP2C19ACHECA12CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-104402751-B | The light sensitive imaging composition of amide containing phenolic compound or its oligomer | 威海经济技术开发区天成化工有限公司 | 2016-07-06 | — | — | CN | claimed |
| CN-104529861-A | Method for synthesizing imide group modified low-molecular-weight line-type phenolic resin and sensitization imaging composition containing imide group modified low-molecular-weight line-type phenolic resin | WEIHAI ECONOMY & TECHNOLOGY ZONE TIANCHENG CHEMICAL ENGINEERING CO LTD | 2015-04-22 | — | — | CN | claimed |
| CN-104402751-A | Photosensitive imaging composition of amide phenol-containing compound or oligomer thereof | WEIHAI ECONOMY & TECHNOLOGY ZONE TIANCHENG CHEMICAL ENGINEERING CO LTD | 2015-03-11 | — | — | CN | claimed |
| CN-103885287-A | Photosensitive composition with sulfonyl hydrazone-modified phenolic resin as acid-producing agent and application thereof | LUCKY HUAGUANG GRAPHICS CO LTD | 2014-06-25 | — | — | CN | claimed |
| CN-1200025-C | High acidolysis active ester ether compound or ether compound based on linear phenolic resin and its synthesis method | UNIV BEIJING NORMAL (CN) | 2005-05-04 | — | — | CN | claimed |
| CN-1459463-A | High acidolysis active ester ether compound or ether compound based on linear phenolic resin and its synthesis method | UNIV BEIJING NORMAL (CN) | 2003-12-03 | — | — | CN | claimed |
| CN-118271868-A | Modified coloring dye and preparation method and application thereof | 乐凯华光印刷科技有限公司 | 2024-07-02 | — | — | CN | disclosed |
| CN-114409848-B | Dissolution inhibitor and preparation method and application thereof | 乐凯华光印刷科技有限公司 | 2023-06-06 | — | — | CN | disclosed |
| CN-114085316-B | Chemical-resistant resin and chemical-resistant thermosensitive plate | 乐凯华光印刷科技有限公司 | 2022-10-25 | — | — | CN | disclosed |
| CN-104402751-B | The light sensitive imaging composition of amide containing phenolic compound or its oligomer | 威海经济技术开发区天成化工有限公司 | 2016-07-06 | — | — | CN | disclosed |
| CN-104529861-A | Method for synthesizing imide group modified low-molecular-weight line-type phenolic resin and sensitization imaging composition containing imide group modified low-molecular-weight line-type phenolic resin | WEIHAI ECONOMY & TECHNOLOGY ZONE TIANCHENG CHEMICAL ENGINEERING CO LTD | 2015-04-22 | — | — | CN | disclosed |
| CN-104402751-A | Photosensitive imaging composition of amide phenol-containing compound or oligomer thereof | WEIHAI ECONOMY & TECHNOLOGY ZONE TIANCHENG CHEMICAL ENGINEERING CO LTD | 2015-03-11 | — | — | CN | disclosed |
| CN-102436144-B | Photosensitive composition and application thereof in positive thermosensitive CTP (computer to plate) plate | LUCKY HUAGUANG GRAPHICS CO LTD | 2014-07-02 | — | — | CN | disclosed |
| CN-1297853-C | Image-forming composition for heat-sensitive CTP image base, acid generating source for the composition and preparation thereof | UNIV BEIJING NORMAL (CN) | 2007-01-31 | — | — | CN | disclosed |
| CN-1815364-A | Light-sensitive composition for chemical amplitude type negative PS plate and chemical amplitude type negative PS plate thereof | UNIV BEIJING NORMAL (CN) | 2006-08-09 | — | — | CN | disclosed |
| CN-1200025-C | High acidolysis active ester ether compound or ether compound based on linear phenolic resin and its synthesis method | UNIV BEIJING NORMAL (CN) | 2005-05-04 | — | — | CN | disclosed |
| CN-1603956-A | Image-forming composition for heat-sensitive CTP image base, acid generating source for the composition and preparation thereof | UNIV BEIJING NORMAL (CN) | 2005-04-06 | — | — | CN | disclosed |
| CN-1459463-A | High acidolysis active ester ether compound or ether compound based on linear phenolic resin and its synthesis method | UNIV BEIJING NORMAL (CN) | 2003-12-03 | — | — | CN | disclosed |
| EP-0549339-A1 | Photosensitive composition | Mitsubishi Chemical Corporation (JP) | 1993-06-30 | — | — | EP | disclosed |
| US-4491677-A | META OR PARA CRESOLS, CRYSTALLIZATION | PHILLIPS PETROLEUM COMPANY (US) | 1985-01-01 | — | — | US | disclosed |