⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16443830 | 0.92 | — | — | |
| SCHEMBL16289090 | 0.90 | LMNA (0.39) | — | |
| SCHEMBL302969 | 0.90 | LMNA (0.39) | — | |
| SCHEMBL16289615 | 0.83 | — | — | |
| SCHEMBL8082561 | 0.74 | — | — | |
| SCHEMBL325901 | 0.74 | — | — | |
| SCHEMBL10821764 | 0.72 | — | — | |
| SCHEMBL25024 | 0.71 | — | — | |
| SCHEMBL20523530 | 0.71 | — | — | |
| SCHEMBL2042353 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230129578-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20150045409-A1 | AMIDE COMPOUND AND USE THEREOF FOR PEST CONTROL | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-02-12 | — | — | US | disclosed |
| EP-2813493-A1 | AMIDE COMPOUND AND USE THEREOF FOR PEST CONTROL | Sumitomo Chemical Company Limited (JP) | 2014-12-17 | — | — | EP | disclosed |
| CN-104114546-A | AMIDE COMPOUND AND USE THEREOF FOR PEST CONTROL | SUMITOMO CHEMICAL CO | 2014-10-22 | — | — | CN | disclosed |
| US-8389616-B2 | Modifiers for nitrile containing elastomers | EXXONMOBIL CHEMICAL PATENTS INC. (US) | 2013-03-05 | — | — | US | disclosed |
| US-20110201750-A1 | Modifiers For Nitrile Containing Elastomers | EXXONMOBIL CHEMICAL PATENTS INC. | 2011-08-18 | — | — | US | disclosed |
| US-20110020600-A1 | Cellulose Acylate Film, Method for Producing Same, Optically Compensatory Film, Anti-Reflection Film, Polarizing Plate and Image Display Device | FUJIFILM CORPORATION (JP) | 2011-01-27 | — | — | US | disclosed |
| WO-2007037540-A9 | CELLULOSE ACYLATE FILM, METHOD FOR PRODUCING SAME, OPTICALLY COMPENSATORY FILM, ANTI-REFLECTION FILM, POLARIZING PLATE AND IMAGE DISPLAY DEVICE | FUJIFILM CORP (JP) | 2007-05-31 | — | — | WO | disclosed |
| WO-2007037540-A1 | CELLULOSE ACYLATE FILM, METHOD FOR PRODUCING SAME, OPTICALLY COMPENSATORY FILM, ANTI-REFLECTION FILM, POLARIZING PLATE AND IMAGE DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2007-04-05 | — | — | WO | disclosed |
| US-20070059458-A1 | Cellulose acylate film, optically compensatory film, polarizing plate and liquid crystal display | FUJI PHOTO FILM CO., LTD. (JP) | 2007-03-15 | — | — | US | disclosed |
| US-20060205881-A1 | Blends of diene rubber with thermoplastic copolymer modifield with nitrile rubber | ZEON CHEMICALS L.P. | 2006-09-14 | — | — | US | disclosed |
| EP-1700886-A1 | Blends of diene rubber with thermoplastic copolymer modified with nitrile rubber | ZEON CHEMICALS L.P. (US) | 2006-09-13 | — | — | EP | disclosed |
| US-6410653-B1 | ACRYLONITRILE-BUTADIENE COPOLYMER | NIPPON ZEON CO., LTD. (JP) | 2002-06-25 | — | — | US | disclosed |