SCHEMBL959339

SCHEMBL959339

C=C(C)C[SiH](OC)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL962807 0.72 HSD17B10 (0.30)
SCHEMBL1071901 0.69
SCHEMBL755334 0.67 HSD17B10 (0.41)
SCHEMBL15065707 0.67
SCHEMBL962645 0.66 ALDH1A1 (0.37)
SCHEMBL674924 0.66
SCHEMBL6897162 0.65 HSD17B10 (0.39)
SCHEMBL29053263 0.65
SCHEMBL2417216 0.63 HSD17B10 (0.61)
SCHEMBL6521972 0.63

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116199848-B Antibacterial polyurethane foam material containing anions and preparation method thereof 南通新艺材料科技有限公司 2024-06-14 CN claimed
WO-2023130848-A1 BIAXIALLY ORIENTED POLYPROPYLENE DIELECTRIC FILM, MODIFIED POLYPROPYLENE MATERIAL AND USE THEREOF 中国石油化工股份有限公司 2023-07-13 WO claimed
CN-116199848-A Antibacterial polyurethane foam material containing anions and preparation method thereof 南通新艺材料科技有限公司 2023-06-02 CN claimed
CN-116199848-B Antibacterial polyurethane foam material containing anions and preparation method thereof 南通新艺材料科技有限公司 2024-06-14 CN disclosed
CN-116199848-A Antibacterial polyurethane foam material containing anions and preparation method thereof 南通新艺材料科技有限公司 2023-06-02 CN disclosed
US-9633755-B2 Conductive composition, conductive member, conductive member production method, touch panel, and solar cell FUJIFILM CORPORATION (JP) 2017-04-25 US disclosed
US-9343594-B2 Conductive composition, conductive member and production method thereof, touch panel, and solar cell FUJIFILM CORPORATION (JP) 2016-05-17 US disclosed
US-9224518-B2 Conductive composition, conductive member, conductive member production method, touch panel, and solar cell FUJIFILM CORPORATION (JP) 2015-12-29 US disclosed
US-9070488-B2 Conductive composition, method of producing the same, conductive member, touch panel, and solar cell FUJIFILM CORPORATION (JP) 2015-06-30 US disclosed
US-20140202531-A1 CONDUCTIVE COMPOSITION, CONDUCTIVE MEMBER AND PRODUCTION METHOD THEREOF, TOUCH PANEL, AND SOLAR CELL FUJIFILM CORPORATION (JP) 2014-07-24 US disclosed
US-20140203223-A1 CONDUCTIVE COMPOSITION, METHOD OF PRODUCING THE SAME, CONDUCTIVE MEMBER, TOUCH PANEL, AND SOLAR CELL FUJIFILM CORPORATION (JP) 2014-07-24 US disclosed
EP-2711397-A1 ACTIVE ENERGY RAY-CURABLE COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING LAMINATE Mitsubishi Rayon Co., Ltd. (JP) 2014-03-26 EP disclosed
US-20110000658-A1 HYDROPHILIC MEMBER FUJIFILM CORPORATION (JP) 2011-01-06 US disclosed
EP-2239137-A1 HYDROPHILIC MEMBERS FUJIFILM Corporation (JP) 2010-10-13 EP disclosed
EP-0823450-B1 COMPOSITE AND MOLDINGS PRODUCED THEREFROM MITSUBISHI RAYON CO (JP) 2004-11-24 EP disclosed
EP-0696621-B1 COATING COMPOSITION AND SURFACE-COATED MOLDING PRODUCED THEREWITH MITSUBISHI RAYON CO (JP) 2000-10-11 EP disclosed
US-5939471-A COLLOIDAL SILICA DISPERSED IN RESIN MITSUBISHI RAYON CO., LTD. (JP) 1999-08-17 US disclosed
EP-0823450-A1 COMPOSITE AND MOLDINGS PRODUCED THEREFROM MITSUBISHI RAYON CO., LTD. (JP) 1998-02-11 EP disclosed
US-5695851-A CROSSLINKABLE, POLYMERIZABLE COMPOSITION CONTAINING (METH)ACRYLOYLOXY GROUPS, SILICA WHOSE SURFACE HAS BEEN MODIFIED WITH AN ORGANOSILANE-CONTAINING COMPOUND, AND A HIGH ENERGY RADIATION POLYMERIZATION INITIATOR MITSUBISHI RAYON CO., LTD. (JP) 1997-12-09 US disclosed
EP-0696621-A1 COATING COMPOSITION AND SURFACE-COATED MOLDING PRODUCED THEREWITH MITSUBISHI RAYON CO., LTD. (JP) 1996-02-14 EP disclosed