⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8640248 | 0.76 | — | — | |
| SCHEMBL432980 | 0.76 | ALDH1A1 (0.32) | — | |
| SCHEMBL6516146 | 0.73 | — | — | |
| SCHEMBL17922844 | 0.71 | ALDH1A1 (0.42) | — | |
| SCHEMBL25187089 | 0.71 | — | — | |
| SCHEMBL27916957 | 0.71 | — | — | |
| SCHEMBL8953565 | 0.69 | ALDH1A1 (0.32) | — | |
| SCHEMBL9492037 | 0.67 | ALDH1A1 (0.33) | — | |
| SCHEMBL3892377 | 0.67 | — | — | |
| SCHEMBL262557 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 49 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105793326-B | Moisture-curable compositions with metal-arene complexes | 莫门蒂夫性能材料股份有限公司 | 2020-07-21 | — | — | CN | claimed |
| EP-3340253-A1 | UV-RESISTANT ELECTRODE ASSEMBLY | Solvay SA (BE) | 2018-06-27 | — | — | EP | claimed |
| EP-3340252-A1 | ELECTRODE ASSEMBLY | Solvay SA (BE) | 2018-06-27 | — | — | EP | claimed |
| US-4499229-A | CONTAINING STABILIZER, CURING AGENT, CATALYST, AND SCAVENGER | GENERAL ELECTRIC COMPANY (US) | 1985-02-12 | — | — | US | claimed |
| US-10589494-B2 | Far infrared reflective film, dispersion for forming far infrared reflective film, manufacturing method of far infrared reflective film, far infrared reflective glass, and window | FUJIFILM CORPORATION (JP) | 2020-03-17 | — | — | US | disclosed |
| EP-3340253-A1 | UV-RESISTANT ELECTRODE ASSEMBLY | Solvay SA (BE) | 2018-06-27 | — | — | EP | disclosed |
| EP-3340252-A1 | ELECTRODE ASSEMBLY | Solvay SA (BE) | 2018-06-27 | — | — | EP | disclosed |
| US-20180079917-A1 | HEAT INSULATION PAINT | FUJIFILM CORPORATION (JP) | 2018-03-22 | — | — | US | disclosed |
| US-20170320302-A1 | FAR INFRARED REFLECTIVE FILM, DISPERSION FOR FORMING FAR INFRARED REFLECTIVE FILM, MANUFACTURING METHOD OF FAR INFRARED REFLECTIVE FILM, FAR INFRARED REFLECTIVE GLASS, AND WINDOW | FUJIFILM CORPORATION (JP) | 2017-11-09 | — | — | US | disclosed |
| CN-103597550-B | Electroconductive member, the manufacture method of electroconductive member, constituent, touch-screen and solar cell | 富士胶片株式会社 | 2017-06-30 | — | — | CN | disclosed |
| US-9633755-B2 | Conductive composition, conductive member, conductive member production method, touch panel, and solar cell | FUJIFILM CORPORATION (JP) | 2017-04-25 | — | — | US | disclosed |
| US-9343594-B2 | Conductive composition, conductive member and production method thereof, touch panel, and solar cell | FUJIFILM CORPORATION (JP) | 2016-05-17 | — | — | US | disclosed |
| EP-1114734-A1 | RESIN COMPOSITION FOR INK-JET RECORDING SHEET AND RECORDING SHEET MADE WITH THE SAME | DAICEL CHEMICAL INDUSTRIES, Ltd. (JP) | 2001-07-11 | — | — | EP | disclosed |
| EP-0696621-B1 | COATING COMPOSITION AND SURFACE-COATED MOLDING PRODUCED THEREWITH | MITSUBISHI RAYON CO (JP) | 2000-10-11 | — | — | EP | disclosed |
| EP-0989162-A1 | THERMOPLASTIC RESIN COMPOSITION, WATER-BASED COMPOSITION, HEAT-SENSITIVE PRESSURE-SENSITIVE ADHESIVE, AND HEAT-SENSITIVE SHEET | Daicel Chemical Industries, Ltd. (JP) | 2000-03-29 | — | — | EP | disclosed |
| EP-0989168-A1 | Water-based coating composition | Daicel Chemical Industries, Ltd. (JP) | 2000-03-29 | — | — | EP | disclosed |
| US-5939471-A | COLLOIDAL SILICA DISPERSED IN RESIN | MITSUBISHI RAYON CO., LTD. (JP) | 1999-08-17 | — | — | US | disclosed |
| EP-0823450-A1 | COMPOSITE AND MOLDINGS PRODUCED THEREFROM | MITSUBISHI RAYON CO., LTD. (JP) | 1998-02-11 | — | — | EP | disclosed |
| US-5695851-A | CROSSLINKABLE, POLYMERIZABLE COMPOSITION CONTAINING (METH)ACRYLOYLOXY GROUPS, SILICA WHOSE SURFACE HAS BEEN MODIFIED WITH AN ORGANOSILANE-CONTAINING COMPOUND, AND A HIGH ENERGY RADIATION POLYMERIZATION INITIATOR | MITSUBISHI RAYON CO., LTD. (JP) | 1997-12-09 | — | — | US | disclosed |
| EP-0696621-A1 | COATING COMPOSITION AND SURFACE-COATED MOLDING PRODUCED THEREWITH | MITSUBISHI RAYON CO., LTD. (JP) | 1996-02-14 | — | — | EP | disclosed |