SCHEMBL9601516

SCHEMBL9601516

CNC(=O)OCO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16541245 0.79 CHRNB2 (0.65)
SCHEMBL9474496 0.79 CHRNB2 (0.52)
SCHEMBL852267 0.78
SCHEMBL42229 0.77
SCHEMBL9601510 0.77
Hydrochloric Acid SCHEMBL27700989 0.76
SCHEMBL12172818 0.74 EPHX1 (0.71)
SCHEMBL19541342 0.74
SCHEMBL22472239 0.74
SCHEMBL16119440 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4078146-A TREATMENT OF CARDIO-VASCULAR DISORDERS AKTIEBOLAGET HASSLE (SW) 1978-03-07 US claimed
US-8859181-B2 Chemically amplified negative resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-10-14 US disclosed
US-8859181-B2 Chemically amplified negative resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-10-14 US disclosed
US-8632939-B2 Polymer, chemically amplified positive resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-01-21 US disclosed
US-8632939-B2 Polymer, chemically amplified positive resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-01-21 US disclosed
EP-2362267-B1 Chemically amplified negative resist composition and patterning process SHINETSU CHEMICAL CO (JP) 2013-01-23 EP disclosed
EP-2362268-B1 Polymer, chemically amplified positive resist compositions and pattern forming process SHINETSU CHEMICAL CO (JP) 2013-01-23 EP disclosed
US-8168729-B2 Thermosetting resin composition DIC CORPORATION (JP) 2012-05-01 US disclosed
US-20110212391-A1 POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-09-01 US disclosed
US-20110212391-A1 POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-09-01 US disclosed
US-20110212390-A1 CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-09-01 US disclosed
US-20110212390-A1 CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-09-01 US disclosed
EP-2362267-A1 Chemically amplified negative resist composition and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2011-08-31 EP disclosed
EP-2362268-A1 Polymer, chemically amplified positive resist composition and pattern forming process Shin-Etsu Chemical Co., Ltd. (JP) 2011-08-31 EP disclosed
US-20090192273-A1 THERMOSETTING RESIN COMPOSITION DIC CORPORATION (JP) 2009-07-30 US disclosed
EP-0232623-B1 1-CARBACEPHALOSPORIN ANTIBIOTICS ELI LILLY AND COMPANY (US) 1993-03-17 EP disclosed
US-4892942-A 1-CARBA (DETHIA)CEPHALOSPORINS ELI LILLY AND COMPANY (US) 1990-01-09 US disclosed
US-4791106-A 1-Carbacephalosporin antibiotics ELI LILLY AND COMPANY (US) 1988-12-13 US disclosed
EP-0232623-A1 1-Carbacephalosporin antibiotics ELI LILLY AND COMPANY (US) 1987-08-19 EP disclosed