SCHEMBL960694

SCHEMBL960694

C=Cc1ccccc1NCCC[Si](OCC)(OCC)OCC

nearest known ligand 0.33

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
CHRM2 P08172 1/20 0.33
MAPT P10636 1/20 0.31
HTT P42858 1/20 0.31
TLR8 Q9NR97 1/20 0.31
NPC1 O15118 1/20 0.30
RAB9A P51151 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15453392 0.88 CHRM2 (0.32) CHRM2MAPTHTTTLR8
SCHEMBL961488 0.86 CHRM2 (0.40) CHRM2MAPTHTTRAB9ASMN1; SMN2
SCHEMBL9516492 0.85 CHRM2 (0.39) CHRM2MAPTHTTTLR8NPC1
SCHEMBL15515693 0.79 CHRM2 (0.36) CHRM2MAPTHTT
SCHEMBL10628642 0.79 TLR8 (0.43) CHRM2MAPTHTTTLR8RAB9A
SCHEMBL9515506 0.78 TLR8 (0.38) CHRM2MAPTHTTTLR8RAB9A
SCHEMBL1506754 0.77 L3MBTL1 (0.43) CHRM2MAPTHTTTLR8NPC1
SCHEMBL960615 0.77 CHRM2 (0.35) CHRM2MAPTHTT
SCHEMBL23248725 0.76 L3MBTL1 (0.45) CHRM2TLR8SMN1; SMN2
SCHEMBL10623845 0.76 L3MBTL1 (0.45) CHRM2TLR8SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3340252-A1 ELECTRODE ASSEMBLY Solvay SA (BE) 2018-06-27 EP claimed
EP-3340253-A1 UV-RESISTANT ELECTRODE ASSEMBLY Solvay SA (BE) 2018-06-27 EP claimed
CN-107209303-B Far infrared ray reflective film, dispersion for forming far infrared ray reflective film, method for producing far infrared ray reflective film, far infrared ray reflective glass, and window 富士胶片株式会社 2020-07-14 CN disclosed
US-10589494-B2 Far infrared reflective film, dispersion for forming far infrared reflective film, manufacturing method of far infrared reflective film, far infrared reflective glass, and window FUJIFILM CORPORATION (JP) 2020-03-17 US disclosed
EP-3340253-A1 UV-RESISTANT ELECTRODE ASSEMBLY Solvay SA (BE) 2018-06-27 EP disclosed
EP-3340252-A1 ELECTRODE ASSEMBLY Solvay SA (BE) 2018-06-27 EP disclosed
US-20180079917-A1 HEAT INSULATION PAINT FUJIFILM CORPORATION (JP) 2018-03-22 US disclosed
US-20170320302-A1 FAR INFRARED REFLECTIVE FILM, DISPERSION FOR FORMING FAR INFRARED REFLECTIVE FILM, MANUFACTURING METHOD OF FAR INFRARED REFLECTIVE FILM, FAR INFRARED REFLECTIVE GLASS, AND WINDOW FUJIFILM CORPORATION (JP) 2017-11-09 US disclosed
EP-3125323-A1 SOLAR CELL Fujifilm Corporation (JP) 2017-02-01 EP disclosed
US-20170005282-A1 SOLAR CELL FUJIFILM CORPORATION (JP) 2017-01-05 US disclosed
US-20150004327-A1 CONDUCTIVE MEMBER AND METHOD FOR MANUFACTURING SAME FUJIFILM CORPORATION (JP) 2015-01-01 US disclosed
US-20140069488-A1 CONDUCTIVE MEMBER, METHOD OF PRODUCING THE SAME, TOUCH PANEL, AND SOLAR CELL FUJIFILM CORPORATION (JP) 2014-03-13 US disclosed
US-20140048131-A1 CONDUCTIVE MEMBER, PRODUCTION METHOD OF THE SAME, TOUCH PANEL, AND SOLAR CELL FUJIFILM CORPORATION (JP) 2014-02-20 US disclosed
US-20140034360-A1 CONDUCTIVE MEMBER, PRODUCTION METHOD OF THE SAME, TOUCH PANEL, AND SOLAR CELL FUJIFILM CORPORATION (JP) 2014-02-06 US disclosed
US-20110000658-A1 HYDROPHILIC MEMBER FUJIFILM CORPORATION (JP) 2011-01-06 US disclosed
EP-2239137-A1 HYDROPHILIC MEMBERS FUJIFILM Corporation (JP) 2010-10-13 EP disclosed
US-20050124747-A1 Coating composition for ink-jet recording medium and ink-jet recording medium DEUTSCHE BANK AG, NEW YORK BRANCH, AS COLLATERAL AGENT 2005-06-09 US disclosed
EP-1470928-A1 COATING COMPOSITION FOR INK-JET RECORDING MEDIUM AND INK-JET RECORDING MEDIUM Clariant International Ltd. (CH) 2004-10-27 EP disclosed
EP-0989162-A1 THERMOPLASTIC RESIN COMPOSITION, WATER-BASED COMPOSITION, HEAT-SENSITIVE PRESSURE-SENSITIVE ADHESIVE, AND HEAT-SENSITIVE SHEET Daicel Chemical Industries, Ltd. (JP) 2000-03-29 EP disclosed
EP-0989168-A1 Water-based coating composition Daicel Chemical Industries, Ltd. (JP) 2000-03-29 EP disclosed