Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.44 |
| ▸ | TSHR | P16473 | 1/20 | 0.44 |
| ▸ | EPHX2 | P34913 | 10/20 | 0.44 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.41 |
| ▸ | CA2 | P00918 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.37 |
| ▸ | P2RX7 | Q99572 | 2/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9608597 | 0.84 | EPHX2 (0.47) | ALDH1A1TSHREPHX2HSD17B10CA2 | |
| SCHEMBL10062765 | 0.77 | ALDH1A1 (0.44) | ALDH1A1TSHREPHX2HSD17B10CA2 | |
| SCHEMBL28305910 | 0.75 | GRIN2D (0.41) | ALDH1A1TSHREPHX2HSD17B10 | |
| SCHEMBL918262 | 0.75 | MEN1 (0.51) | ALDH1A1TSHREPHX2HSD17B10KMT2A | |
| SCHEMBL9609284 | 0.74 | ALDH1A1 (0.40) | ALDH1A1TSHREPHX2HSD17B10CA2 | |
| SCHEMBL1010509 | 0.74 | EPHX2 (0.47) | ALDH1A1TSHREPHX2CA2KMT2A | |
| SCHEMBL11991285 | 0.73 | GRIN2D (0.42) | ALDH1A1TSHREPHX2HSD17B10 | |
| SCHEMBL19808496 | 0.72 | ALDH1A1 (0.53) | ALDH1A1TSHREPHX2HSD17B10CA2 | |
| SCHEMBL21397003 | 0.71 | GRIN2D (0.50) | ALDH1A1TSHREPHX2CA2KMT2A | |
| SCHEMBL9609292 | 0.70 | ALDH1A1 (0.42) | ALDH1A1TSHREPHX2HSD17B10CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120135348-A1 | ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2012-05-31 | — | — | US | disclosed |