⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20758033 | 0.95 | — | — | |
| SCHEMBL20805466 | 0.95 | — | — | |
| SCHEMBL20805467 | 0.95 | — | — | |
| SCHEMBL20805469 | 0.95 | — | — | |
| SCHEMBL22855974 | 0.95 | — | — | |
| SCHEMBL20805470 | 0.95 | — | — | |
| SCHEMBL20812330 | 0.95 | — | — | |
| SCHEMBL12467175 | 0.89 | — | — | |
| SCHEMBL12237367 | 0.87 | LMNA (0.39) | — | |
| SCHEMBL22930367 | 0.83 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 120 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024150805-A1 | TUBE AND CELL CULTURE DEVICE | 東京応化工業株式会社 | 2024-07-18 | — | — | WO | disclosed |
| EP-4283745-A1 | ELECTROLYTE SOLUTION, SECONDARY BATTERY, BATTERY MODULE, BATTERY PACK, AND ELECTRIC DEVICE | Contemporary Amperex Technology Co., Limited (CN) | 2023-11-29 | — | — | EP | disclosed |
| US-20230357180-A1 | DEGRADERS AND DEGRONS FOR TARGETED PROTEIN DEGRADATION | C4 THERAPEUTICS, INC. (US) | 2023-11-09 | — | — | US | disclosed |
| US-20230357180-A1 | DEGRADERS AND DEGRONS FOR TARGETED PROTEIN DEGRADATION | C4 THERAPEUTICS, INC. (US) | 2023-11-09 | — | — | US | disclosed |
| US-11807815-B2 | Method of producing plastic pyrolysis products from a mixed plastics stream | SAUDI ARABIAN OIL COMPANY (SA) | 2023-11-07 | — | — | US | disclosed |
| WO-2023193230-A1 | ELECTROLYTE SOLUTION, SECONDARY BATTERY, BATTERY MODULE, BATTERY PACK, AND ELECTRIC DEVICE | 宁德时代新能源科技股份有限公司 | 2023-10-12 | — | — | WO | disclosed |
| US-20230279023-A1 | N/O-Linked Degrons and Degronimers for Protein Degradation | C4 THERAPEUTICS, INC. (US) | 2023-09-07 | — | — | US | disclosed |
| US-20230279023-A1 | N/O-Linked Degrons and Degronimers for Protein Degradation | C4 THERAPEUTICS, INC. (US) | 2023-09-07 | — | — | US | disclosed |
| US-11712777-B2 | Cationic fluoropolymer composite polishing pad | ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. (US) | 2023-08-01 | — | — | US | disclosed |
| WO-2023085296-A1 | FLUORINE-CONTAINING COMPOSITION AND PRODUCTION METHOD THEREFOR | ダイキン工業株式会社 | 2023-05-19 | — | — | WO | disclosed |
| US-20100305145-A1 | Substituted Aminobutyric Derivatives as Neprilysin Inhibitors | NOVARTIS AG (CH) | 2010-12-02 | — | — | US | disclosed |
| US-20100305145-A1 | Substituted Aminobutyric Derivatives as Neprilysin Inhibitors | NOVARTIS AG (CH) | 2010-12-02 | — | — | US | disclosed |
| US-20100305131-A1 | Substituted Aminopropionic Derivatives as Neprilysin inhibitors | NOVARTIS AG (CH) | 2010-12-02 | — | — | US | disclosed |
| US-20100305131-A1 | Substituted Aminopropionic Derivatives as Neprilysin inhibitors | NOVARTIS AG (CH) | 2010-12-02 | — | — | US | disclosed |
| US-20100261117-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION AND METHOD OF FORMING RESIST PATTERN | FUJIFILM CORPORATION (JP) | 2010-10-14 | — | — | US | disclosed |
| US-20100216072-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION, PATTERN FORMING METHOD USING THE COMPOSITION AND RESIN FOR USE IN THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-08-26 | — | — | US | disclosed |
| WO-2010067898-A2 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-06-17 | — | — | WO | disclosed |
| EP-2112183-A1 | CURABLE RESIN COMPOSITION AND METHOD FOR PRODUCING THE SAME | Daikin Industries, Ltd. (JP) | 2009-10-28 | — | — | EP | disclosed |
| EP-1378285-B1 | Gas separation using membranes formed from blends of perfluorinated polymers | AIR LIQUIDE (FR) | 2009-04-08 | — | — | EP | disclosed |
| US-7189492-B2 | Photosensitive composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2007-03-13 | — | — | US | disclosed |