SCHEMBL961436

SCHEMBL961436

CO[Si](C)(CCCOc1cccc(N)c1)OC

nearest known ligand 0.58

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.58
CYP3A4 P08684 2/20 0.53
TP53 P04637 1/20 0.53
ALDH1A1 P00352 1/20 0.49
MAOB P27338 2/20 0.45
APP P05067 1/20 0.42
SMN1; SMN2 Q16637 2/20 0.39
LTA4H P09960 1/20 0.39
NPC1 O15118 1/20 0.39
LMNA P02545 1/20 0.39
MAPT P10636 1/20 0.39
RAB9A P51151 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8361890 0.88 TSHR (0.58) TSHRCYP3A4TP53ALDH1A1MAOB
SCHEMBL109946 0.86 TSHR (0.59) TSHRCYP3A4TP53ALDH1A1MAOB
SCHEMBL30781624 0.86 TSHR (0.59) TSHRCYP3A4TP53ALDH1A1MAOB
SCHEMBL893806 0.83 TSHR (0.59) TSHRCYP3A4TP53ALDH1A1MAOB
SCHEMBL5155637 0.82 TSHR (0.52) TSHRCYP3A4TP53ALDH1A1MAOB
SCHEMBL7131135 0.82 TSHR (0.64) TSHRCYP3A4TP53ALDH1A1MAOB
SCHEMBL10594544 0.80 TSHR (0.56) TSHRCYP3A4TP53ALDH1A1MAOB
SCHEMBL2825029 0.80 KCNA3 (0.56) ALDH1A1LTA4H
SCHEMBL29437038 0.79 TSHR (0.72) TSHRCYP3A4TP53ALDH1A1MAOB
SCHEMBL6756802 0.79 TSHR (0.72) TSHRCYP3A4TP53ALDH1A1MAOB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3340252-A1 ELECTRODE ASSEMBLY Solvay SA (BE) 2018-06-27 EP claimed
EP-3340253-A1 UV-RESISTANT ELECTRODE ASSEMBLY Solvay SA (BE) 2018-06-27 EP claimed
CN-107209303-B Far infrared ray reflective film, dispersion for forming far infrared ray reflective film, method for producing far infrared ray reflective film, far infrared ray reflective glass, and window 富士胶片株式会社 2020-07-14 CN disclosed
US-10589494-B2 Far infrared reflective film, dispersion for forming far infrared reflective film, manufacturing method of far infrared reflective film, far infrared reflective glass, and window FUJIFILM CORPORATION (JP) 2020-03-17 US disclosed
EP-3340253-A1 UV-RESISTANT ELECTRODE ASSEMBLY Solvay SA (BE) 2018-06-27 EP disclosed
EP-3340252-A1 ELECTRODE ASSEMBLY Solvay SA (BE) 2018-06-27 EP disclosed
US-20180079917-A1 HEAT INSULATION PAINT FUJIFILM CORPORATION (JP) 2018-03-22 US disclosed
US-20170320302-A1 FAR INFRARED REFLECTIVE FILM, DISPERSION FOR FORMING FAR INFRARED REFLECTIVE FILM, MANUFACTURING METHOD OF FAR INFRARED REFLECTIVE FILM, FAR INFRARED REFLECTIVE GLASS, AND WINDOW FUJIFILM CORPORATION (JP) 2017-11-09 US disclosed
EP-3125323-A1 SOLAR CELL Fujifilm Corporation (JP) 2017-02-01 EP disclosed
US-20170005282-A1 SOLAR CELL FUJIFILM CORPORATION (JP) 2017-01-05 US disclosed
US-20150004327-A1 CONDUCTIVE MEMBER AND METHOD FOR MANUFACTURING SAME FUJIFILM CORPORATION (JP) 2015-01-01 US disclosed
US-20140069488-A1 CONDUCTIVE MEMBER, METHOD OF PRODUCING THE SAME, TOUCH PANEL, AND SOLAR CELL FUJIFILM CORPORATION (JP) 2014-03-13 US disclosed
US-20140048131-A1 CONDUCTIVE MEMBER, PRODUCTION METHOD OF THE SAME, TOUCH PANEL, AND SOLAR CELL FUJIFILM CORPORATION (JP) 2014-02-20 US disclosed
US-20140034360-A1 CONDUCTIVE MEMBER, PRODUCTION METHOD OF THE SAME, TOUCH PANEL, AND SOLAR CELL FUJIFILM CORPORATION (JP) 2014-02-06 US disclosed
US-20110000658-A1 HYDROPHILIC MEMBER FUJIFILM CORPORATION (JP) 2011-01-06 US disclosed
EP-2239137-A1 HYDROPHILIC MEMBERS FUJIFILM Corporation (JP) 2010-10-13 EP disclosed
US-4645844-A Functionally substituted phenoxyalkyl alkoxysilanes and method for preparing same M&T CHEMICALS INC. (US) 1987-02-24 US disclosed