SCHEMBL962438

SCHEMBL962438

C=C(C)C(=O)OC(O)c1ccccc1

nearest known ligand 0.50

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
HPGD P15428 1/20 0.50
ELANE P08246 1/20 0.44
ALDH1A1 P00352 3/20 0.42
CYP3A4 P08684 1/20 0.42
LMNA P02545 3/20 0.41
MAPK1 P28482 1/20 0.41
KMT2A Q03164 2/20 0.40
ESR1 P03372 1/20 0.39
ESR2 Q92731 1/20 0.39
CYP2D6 P10635 1/20 0.38
SRC P12931 1/20 0.38
HCAR2 Q8TDS4 1/20 0.38
CES2 O00748 2/20 0.37
CES1 P23141 2/20 0.37
KDM4E B2RXH2 1/20 0.37
MTNR1A P48039 1/20 0.36
MTNR1B P49286 1/20 0.36
MEN1 O00255 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1131746 0.85 ESR1 (0.49) HPGDELANEALDH1A1CYP3A4LMNA
SCHEMBL30722859 0.85 HPGD (0.48) HPGDALDH1A1CYP3A4LMNAMAPK1
SCHEMBL1437800 0.83 ALDH1A1 (0.47) HPGDELANEALDH1A1CYP3A4LMNA
SCHEMBL28888132 0.82 HPGD (0.47) HPGDELANEALDH1A1CYP3A4LMNA
SCHEMBL10907558 0.81 HCAR2 (0.53) HPGDELANEALDH1A1CYP3A4LMNA
SCHEMBL21768706 0.81 HPGD (0.46) HPGDELANEALDH1A1CYP3A4LMNA
SCHEMBL41864 0.81 HCAR2 (0.53) HPGDELANEALDH1A1CYP3A4LMNA
SCHEMBL5062426 0.80 ALDH1A1 (0.56) HPGDALDH1A1CYP3A4LMNAMAPK1
SCHEMBL8366247 0.80 ALDH1A1 (0.49) HPGDELANEALDH1A1CYP3A4LMNA
SCHEMBL527905 0.80 HPGD (0.44) HPGDELANEALDH1A1CYP3A4LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 183 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118108890-B G-line and h-line light absorption resin and preparation method thereof 广东粤港澳大湾区黄埔材料研究院 2024-07-02 CN claimed
CN-118108890-A G-line and h-line light absorption resin and preparation method thereof 广东粤港澳大湾区黄埔材料研究院 2024-05-31 CN claimed
CN-112745655-A Modified polyphenyl ether and polyethylene co-extrusion section bar and preparation method thereof 哈尔滨中大型材科技股份有限公司 2021-05-04 CN claimed
US-4369298-A Novel cured resin, process for production thereof, and lens composed of said resin from bis(alkyleneoxyphenyl)-diacrylate, bis(alkyleneoxyphenyl)diallyl ether, bis(alkyleneoxyphenyl)diallyl carbonate monomers TOKUYAMA SODA KABUSHIKI KAISHA (JP) 1983-01-18 US claimed
EP-3922673-B1 RESIN COMPOSITION, THERMOPLASTIC RESIN COMPOSITION, AND THERMOPLASTIC RESIN MOLDING NOF CORP (JP) 2025-04-02 EP disclosed
CN-118108890-B G-line and h-line light absorption resin and preparation method thereof 广东粤港澳大湾区黄埔材料研究院 2024-07-02 CN disclosed
CN-118108890-A G-line and h-line light absorption resin and preparation method thereof 广东粤港澳大湾区黄埔材料研究院 2024-05-31 CN disclosed
US-20230279244-A1 RESIN COMPOSITION, COATED AND DRIED PRODUCT, MELT-KNEADED PRODUCT, OPTICAL FILTER, IMAGE DISPLAY DEVICE, SOLID-STATE IMAGING ELEMENT, SQUARYLIUM COMPOUND, AND METHOD FOR PRODUCING THE SAME FUJIFILM CORPORATION (JP) 2023-09-07 US disclosed
US-11746225-B2 Resin composition, thermoplastic resin composition, and thermoplastic resin molding NOF CORPORATION (JP) 2023-09-05 US disclosed
CN-116490511-A Resin composition, coated dried product, melt-kneaded product, optical filter, image display device, solid-state imaging element, squaraine compound, and method for producing same 富士胶片株式会社 2023-07-25 CN disclosed
CN-113195622-B Resin composition, thermoplastic resin composition, and thermoplastic resin molded body 日油株式会社 2023-06-06 CN disclosed
US-11634545-B2 Layered-substance-containing solution and method of manufacturing same ADEKA CORPORATION (JP) 2023-04-25 US disclosed
US-6007964-A PHOTOSENSITIVE LAYER CONTAINING POLYMER WITH SIDE CHAIN HAVING SULFONATE GROUPAND AN ACID GENERATING COMPOUND FUJI PHOTO FILM CO., LTD. (JP) 1999-12-28 US disclosed
EP-0950515-A2 Heat-hardenable composition and planographic form plate using the composition FUJI PHOTO FILM CO., LTD (JP) 1999-10-20 EP disclosed
EP-0941839-A2 Radiant ray-sensitive lithographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 1999-09-15 EP disclosed
EP-0922570-A2 Planographic printing plate precursor and a method for producing a planographic plate Fuji Photo Film Co., Ltd. (JP) 1999-06-16 EP disclosed
EP-0903224-A2 Radiation-sensitive planographic plate FUJI PHOTO FILM CO., LTD. (JP) 1999-03-24 EP disclosed
EP-0869394-A1 Planographic original plate FUJI PHOTO FILM CO., LTD. (JP) 1998-10-07 EP disclosed
EP-0855267-A2 Planographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 1998-07-29 EP disclosed
US-4369298-A Novel cured resin, process for production thereof, and lens composed of said resin from bis(alkyleneoxyphenyl)-diacrylate, bis(alkyleneoxyphenyl)diallyl ether, bis(alkyleneoxyphenyl)diallyl carbonate monomers TOKUYAMA SODA KABUSHIKI KAISHA (JP) 1983-01-18 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230279244-A1 RESIN COMPOSITION, COATED AND DRIED PRODUCT, MELT-KNEADED PRODUCT, OPTICAL FILTER, IMAGE DISPLAY DEVICE, SOLID-STATE IMAGING ELEMENT, SQUARYLIUM COMPOUND, AND METHOD FOR PRODUCING THE SAME KLK5, KLHDC2, TNFRSF9 HPGD 3093/4885ELANE 3939/4885ALDH1A1 3701/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.