SCHEMBL962969

SCHEMBL962969

CO[Si](OC)(OC)c1cccc(C)c1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ACHE P22303 4/20 0.48
ALDH1A1 P00352 3/20 0.39
MAPK1 P28482 1/20 0.39
IDO1 P14902 2/20 0.36
RELA Q04206 1/20 0.36
TP53 P04637 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
LMNA P02545 2/20 0.35
NPC1 O15118 1/20 0.34
CASP3 P42574 1/20 0.34
SENP8 Q96LD8 1/20 0.34
SENP7 Q9BQF6 1/20 0.34
SENP6 Q9GZR1 1/20 0.34
CYP1A2 P05177 1/20 0.34
CYP3A4 P08684 1/20 0.34
CYP2D6 P10635 1/20 0.34
MAPT P10636 1/20 0.34
CYP2C9 P11712 1/20 0.34
CYP2C19 P33261 1/20 0.34
HTT P42858 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15407985 0.92 ACHE (0.41) ACHEALDH1A1MAPK1IDO1RELA
SCHEMBL574627 0.85 ACHE (0.32) ACHEALDH1A1MAPK1CYP1A2CYP3A4
SCHEMBL387599 0.84 ACHE (0.46) ACHEALDH1A1MAPK1IDO1RELA
SCHEMBL1562121 0.82 ACHE (0.48) ACHEALDH1A1MAPK1IDO1RELA
SCHEMBL29672899 0.82 ACHE (0.48) ACHEALDH1A1MAPK1IDO1RELA
Toluene SCHEMBL23646894 0.79 ACHE (0.52) ACHEALDH1A1MAPK1RELATDP1
SCHEMBL13027843 0.77 ACHE (0.39) ACHE
SCHEMBL6561373 0.77 ACHE (0.42) ACHEALDH1A1MAPK1IDO1TDP1
SCHEMBL6564109 0.77 ACHE (0.42) ACHEALDH1A1MAPK1IDO1TP53
SCHEMBL9325410 0.76 IDO1 (0.32) IDO1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 93 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119912483-A Preparation method and equipment of phenyl organosiloxane compound 洛阳中硅高科技有限公司 2025-05-02 CN claimed
CN-112142660-B Method for simply, conveniently and efficiently synthesizing 4-aryl butyric acid derivative 淮阴师范学院 2021-11-23 CN claimed
CN-112142660-A Method for simply, conveniently and efficiently synthesizing 4-aryl butyric acid derivative 淮阴师范学院 2020-12-29 CN claimed
US-7499618-B2 Optical element KONICA MINOLTA OPTO, INC. (JP) 2009-03-03 US claimed
EP-1635194-A1 OPTICAL ELEMENT Konica Minolta Opto, Inc. (JP) 2006-03-15 EP claimed
US-20050078926-A1 Unknown KONICA MINOLTA OPTO, INC. (JP) 2005-04-14 US claimed
CN-119912483-A Preparation method and equipment of phenyl organosiloxane compound 洛阳中硅高科技有限公司 2025-05-02 CN disclosed
WO-2024190380-A1 SILICON-CONTAINING RESIN COMPOSITION PURIFIED PRODUCT MANUFACTURING METHOD, PATTERN FORMATION METHOD, AND SILICON-CONTAINING RESIN COMPOSITION PURIFIED PRODUCT 東京応化工業株式会社 2024-09-19 WO disclosed
US-20230340266-A1 SILICON-CONTAINING COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE JSR CORPORATION (JP) 2023-10-26 US disclosed
CN-112142660-B Method for simply, conveniently and efficiently synthesizing 4-aryl butyric acid derivative 淮阴师范学院 2021-11-23 CN disclosed
WO-2021122431-A1 POLYURETHANE FOAMS BASED ON POLYETHER CARBONATE POLYOLS COVESTRO INTELLECTUAL PROPERTY GMBH & CO. KG (DE) 2021-06-24 WO disclosed
EP-3838964-A1 POLYURETHANE FOAMS BASED ON POLYETHER CARBONATE POLYOLS Covestro Deutschland AG (DE) 2021-06-23 EP disclosed
CN-112142660-A Method for simply, conveniently and efficiently synthesizing 4-aryl butyric acid derivative 淮阴师范学院 2020-12-29 CN disclosed
US-20050078926-A1 Unknown KONICA MINOLTA OPTO, INC. (JP) 2005-04-14 US disclosed
US-20050063281-A1 Optical pickup apparatus, optical element for optical pickup apparatus and producing method of optical element KONICA MINOLTA OPTO, INC. 2005-03-24 US disclosed
US-20050047315-A1 Semiconductor laser light source device and optical pickup device KONICA MINOLTA OPTO, INC. 2005-03-03 US disclosed
EP-1122746-B1 Composition for film formation and insulating film JSR CORP (JP) 2004-09-22 EP disclosed
US-6468589-B2 A HEAT-CURED POLYETHER BASED ON A 9,9-BIS(P-HYDROXYPHENYL)-FLUORENE HAVING AT LEAST ONE ALKYL SUBSTITUENT AND A DIHYDROXY AROMATIC COMONOMER; LOW DIELECTRIC PROTECTIVE COATINGS; HEAT RESISTANCE; NONCRACKING JSR CORPORATION (JP) 2002-10-22 US disclosed
US-20010012870-A1 Composition for film formation and insulating film JSR CORPORATION (JP) 2001-08-09 US disclosed
EP-1122746-A1 Composition for film formation and insulating film JSR Corporation (JP) 2001-08-08 EP disclosed