SCHEMBL9632168

SCHEMBL9632168

CC1(C(Cl)Cl)C=CC(=O)C=C1

nearest known ligand 0.52

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
CYP2C19 P33261 1/20 0.38
ALDH1A1 P00352 1/20 0.33
BCHE P06276 1/20 0.33
POLB P06746 1/20 0.33
MAOA P21397 1/20 0.33
ACHE P22303 1/20 0.33
MAOB P27338 1/20 0.33
APEX1 P27695 1/20 0.33
MAPK1 P28482 1/20 0.33
CASP1 P29466 1/20 0.33
RECQL P46063 1/20 0.33
BLM P54132 1/20 0.33
MDM2 Q00987 1/20 0.33
DHODH Q02127 1/20 0.33
HSD17B10 Q99714 1/20 0.33
APOBEC3G Q9HC16 1/20 0.33
TDP1 Q9NUW8 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18850533 0.79 ALDH1A1 (0.37) CYP2C19ALDH1A1BCHEPOLBMAOA
SCHEMBL1100011 0.69
SCHEMBL20079635 0.65
SCHEMBL10454809 0.65
SCHEMBL363382 0.65 CYP2C19 (0.52) CYP2C19ALDH1A1BCHEPOLBMAOA
SCHEMBL10491543 0.64
SCHEMBL10892281 0.63
SCHEMBL11609739 0.62 ALDH1A1 (0.35) CYP2C19ALDH1A1BCHEPOLBMAOA
SCHEMBL7117260 0.62 ALDH1A1 (0.35) CYP2C19ALDH1A1BCHEPOLBMAOA
SCHEMBL10455903 0.60

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0202690-B1 PHOTOIMAGING COMPOSITIONS CONTAINING SUBSTITUTED CYCLOHEXADIENONE COMPOUNDS E.I. DU PONT DE NEMOURS AND COMPANY (US) 1989-04-26 EP claimed
EP-0135059-B1 PHOTOIMAGING COMPOSITIONS CONTAINING SUBSTITUTED CYCLOHEXADIENONE COMPOUNDS E.I. DU PONT DE NEMOURS AND COMPANY (US) 1987-09-09 EP claimed
EP-0202690-A2 Photoimaging compositions containing substituted cyclohexadienone compounds E.I. DU PONT DE NEMOURS AND COMPANY (US) 1986-11-26 EP claimed
EP-0066870-B1 PHOTOIMAGING COMPOSITIONS CONTAINING SUBSTITUTED CYCLOHEXADIENONE COMPOUNDS E.I. DU PONT DE NEMOURS AND COMPANY (US) 1985-11-21 EP claimed
EP-0135059-A1 Photoimaging compositions containing substituted cyclohexadienone compounds E.I. DU PONT DE NEMOURS AND COMPANY (US) 1985-03-27 EP claimed
EP-0066870-A2 Photoimaging compositions containing substituted cyclohexadienone compounds E.I. DU PONT DE NEMOURS AND COMPANY (US) 1982-12-15 EP claimed
US-4341860-A A P-DI-OR TRICHLOROCYCLOHEXADIENONE OXIDIZER AND A LEUCO DYE OR UNSATURATED MONOMER; PHOTORESISTS; PHOTOPRINTOUT ELEMENTS E. I. DU PONT DE NEMOURS AND COMPANY (US) 1982-07-27 US claimed
EP-0372817-B1 NOVEL HETEROCYCLIC PESTICIDAL COMPOUNDS THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) 1992-05-13 EP disclosed
US-4985411-A Insecticides, Acaricides THE WELLCOME FOUNDATION LTD. (GB) 1991-01-15 US disclosed
EP-0372817-A1 Novel heterocyclic pesticidal compounds THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) 1990-06-13 EP disclosed
EP-0202690-B1 PHOTOIMAGING COMPOSITIONS CONTAINING SUBSTITUTED CYCLOHEXADIENONE COMPOUNDS E.I. DU PONT DE NEMOURS AND COMPANY (US) 1989-04-26 EP disclosed
EP-0135059-B1 PHOTOIMAGING COMPOSITIONS CONTAINING SUBSTITUTED CYCLOHEXADIENONE COMPOUNDS E.I. DU PONT DE NEMOURS AND COMPANY (US) 1987-09-09 EP disclosed
EP-0202690-A2 Photoimaging compositions containing substituted cyclohexadienone compounds E.I. DU PONT DE NEMOURS AND COMPANY (US) 1986-11-26 EP disclosed
EP-0062474-B1 PHOTOSENSITIVE COMPOSITIONS CONTAINING A POLYENE E.I. DU PONT DE NEMOURS AND COMPANY (US) 1985-02-13 EP disclosed
EP-0099949-A1 Improved aqueous processable, positive-working photopolymer compositions E.I. DU PONT DE NEMOURS AND COMPANY (US) 1984-02-08 EP disclosed
US-4415652-A ALKENYLAMINE-MODIFIED MALEIC ANHYDRIDE COPOLYMER, A MERCAPTO-CONTAINING CARBOXYLIC ACID AND PHOTOINITIATOR; LITHOGRAPHY E. I. DU PONT DE NEMOURS & CO. (US) 1983-11-15 US disclosed
US-4415651-A UNSATURATED ADDITION POLYMER, A MERCAPTO-CONTAINING CARBOXYLIC ACID AND A PHOTOINITIATORS; LITHOGRAPHY E. I. DU PONT DE NEMOURS AND COMPANY (US) 1983-11-15 US disclosed
EP-0073837-A1 PROCESS FOR SELECTIVELY PRODUCING PARA-SUBSTITUTED DERIVATIVES OF PHENOLS Asahi Kasei Kogyo Kabushiki Kaisha (JP) 1983-03-16 EP disclosed
EP-0062474-A1 Photosensitive compositions containing a polyene E.I. DU PONT DE NEMOURS AND COMPANY (US) 1982-10-13 EP disclosed
US-4341860-A A P-DI-OR TRICHLOROCYCLOHEXADIENONE OXIDIZER AND A LEUCO DYE OR UNSATURATED MONOMER; PHOTORESISTS; PHOTOPRINTOUT ELEMENTS E. I. DU PONT DE NEMOURS AND COMPANY (US) 1982-07-27 US disclosed