Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2C19 | P33261 | 1/20 | 1.00 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10601626 | 0.71 | CYP2C19 (0.55) | CYP2C19 | |
| SCHEMBL6849346 | 0.70 | CYP2C19 (0.54) | CYP2C19 | |
| SCHEMBL363382 | 0.69 | CYP2C19 (0.52) | CYP2C19 | |
| SCHEMBL2602140 | 0.67 | CYP2C19 (0.50) | CYP2C19 | |
| SCHEMBL10603578 | 0.64 | CYP2C19 (0.47) | CYP2C19 | |
| SCHEMBL10455724 | 0.64 | CYP2C19 (0.47) | CYP2C19 | |
| SCHEMBL29046149 | 0.64 | CYP2C19 (0.47) | CYP2C19 | |
| SCHEMBL2600482 | 0.62 | CYP2C19 (0.44) | CYP2C19 | |
| SCHEMBL10605855 | 0.61 | CYP2C19 (0.44) | CYP2C19 | |
| SCHEMBL1100011 | 0.58 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0372817-B1 | NOVEL HETEROCYCLIC PESTICIDAL COMPOUNDS | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) | 1992-05-13 | — | — | EP | disclosed |
| US-4985411-A | Insecticides, Acaricides | THE WELLCOME FOUNDATION LTD. (GB) | 1991-01-15 | — | — | US | disclosed |
| EP-0372817-A1 | Novel heterocyclic pesticidal compounds | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) | 1990-06-13 | — | — | EP | disclosed |
| EP-0202690-B1 | PHOTOIMAGING COMPOSITIONS CONTAINING SUBSTITUTED CYCLOHEXADIENONE COMPOUNDS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1989-04-26 | — | — | EP | disclosed |
| EP-0135059-B1 | PHOTOIMAGING COMPOSITIONS CONTAINING SUBSTITUTED CYCLOHEXADIENONE COMPOUNDS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-09-09 | — | — | EP | disclosed |
| EP-0127762-B1 | CONSTRAINED N-ALKYLAMINO ARYL KETONES AS SENSITIZERS FOR PHOTOPOLYMER COMPOSITIONS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-07-22 | — | — | EP | disclosed |
| EP-0103294-B1 | N-ALKYLINDOLYLIDENE AND N-ALKYLBENZOTHIAZOLYLIDENE ALKANONES AS SENSITIZERS FOR PHOTOPOLYMER COMPOSITIONS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1986-12-30 | — | — | EP | disclosed |
| EP-0202690-A2 | Photoimaging compositions containing substituted cyclohexadienone compounds | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1986-11-26 | — | — | EP | disclosed |
| US-4555473-A | ETHYLENICALLY UNSATURATED MONOMER, PHOTOINITIATOR, BINDER | E. I. DUPONT DE NEMOURS AND COMPANY (US) | 1985-11-26 | — | — | US | disclosed |
| EP-0066870-B1 | PHOTOIMAGING COMPOSITIONS CONTAINING SUBSTITUTED CYCLOHEXADIENONE COMPOUNDS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1985-11-21 | — | — | EP | disclosed |
| US-4535052-A | HIGH SPEED PHOTORESISTS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1985-08-13 | — | — | US | disclosed |
| EP-0127762-A1 | Constrained N-alkylamino aryl ketones as sensitizers for photopolymer compositions | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1984-12-12 | — | — | EP | disclosed |
| US-4454218-A | WITH UNSATURATED COMPOUND AND PHOTOINITIATOR | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1984-06-12 | — | — | US | disclosed |
| EP-0099949-A1 | Improved aqueous processable, positive-working photopolymer compositions | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1984-02-08 | — | — | EP | disclosed |
| US-4415652-A | ALKENYLAMINE-MODIFIED MALEIC ANHYDRIDE COPOLYMER, A MERCAPTO-CONTAINING CARBOXYLIC ACID AND PHOTOINITIATOR; LITHOGRAPHY | E. I. DU PONT DE NEMOURS & CO. (US) | 1983-11-15 | — | — | US | disclosed |
| US-4415651-A | UNSATURATED ADDITION POLYMER, A MERCAPTO-CONTAINING CARBOXYLIC ACID AND A PHOTOINITIATORS; LITHOGRAPHY | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1983-11-15 | — | — | US | disclosed |
| EP-0062474-A1 | Photosensitive compositions containing a polyene | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1982-10-13 | — | — | EP | disclosed |
| US-4341860-A | A P-DI-OR TRICHLOROCYCLOHEXADIENONE OXIDIZER AND A LEUCO DYE OR UNSATURATED MONOMER; PHOTORESISTS; PHOTOPRINTOUT ELEMENTS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1982-07-27 | — | — | US | disclosed |