⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15453552 | 0.72 | — | — | |
| SCHEMBL436115 | 0.69 | — | — | |
| SCHEMBL2790722 | 0.69 | — | — | |
| SCHEMBL2452950 | 0.69 | ALDH1A1 (0.30) | — | |
| SCHEMBL810631 | 0.69 | — | — | |
| SCHEMBL22712610 | 0.67 | TSHR (0.33) | — | |
| SCHEMBL35278 | 0.67 | — | — | |
| SCHEMBL5130531 | 0.67 | — | — | |
| SCHEMBL11419633 | 0.67 | — | — | |
| SCHEMBL28817330 | 0.65 | TSHR (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 192 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105452393-B | It can be thermally cured coating system | 荷兰应用自然科学研究组织TNO | 2019-04-09 | — | — | CN | claimed |
| US-10144848-B2 | Thermally curable coating systems | NEDERLANDSE ORGANISATIE VOOR TOEGEPAST-NATUURWETENSCHAPPELIJK ONDERZOEK TNO (NL) | 2018-12-04 | — | — | US | claimed |
| EP-2999753-B1 | THERMALLY CURABLE COATING SYSTEMS | TNO (NL) | 2018-07-25 | — | — | EP | claimed |
| US-20160122584-A1 | THERMALLY CURABLE COATING SYSTEMS | NEDERLANDSE ORGANISATIE VOOR TOEGEPAST-NATUURWETENSCHAPPELIJK ONDERZOEK TNO (NL) | 2016-05-05 | — | — | US | claimed |
| EP-2999753-A1 | THERMALLY CURABLE COATING SYSTEMS | Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO (NL) | 2016-03-30 | — | — | EP | claimed |
| CN-105452393-A | Thermally curable coating systems | NEDERLANDSE ORGANISATIE VOOR TOEGEPAST-NATUURWETENSCHAPPELIJK ONDERZOEK TNO | 2016-03-30 | — | — | CN | claimed |
| EP-2808364-A1 | Thermally curable coating systems | Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO (NL) | 2014-12-03 | — | — | EP | claimed |
| WO-2014189373-A1 | THERMALLY CURABLE COATING SYSTEMS | NEDERLANDSE ORGANISATIE VOOR TOEGEPAST-NATUURWETENSCHAPPELIJK ONDERZOEK TNO (NL) | 2014-11-27 | — | — | WO | claimed |
| US-20240030448-A1 | CONDUCTIVE MATERIAL DISPERSION, AND METHODS FOR MANUFACTURING POSITIVE ELECTRODE FOR LITHIUM ION SECONDARY BATTERY AND LITHIUM ION SECONDARY BATTERY USING SAME | MIKUNI SHIKISO KABUSHIKI KAISHA (JP) | 2024-01-25 | — | — | US | disclosed |
| US-11692093-B2 | Resin composition, method for producing three-dimensional molding using same, and three-dimensional molding | Konica Minolta, Inc. (JP) | 2023-07-04 | — | — | US | disclosed |
| CN-112657447-B | Chemical conversion process | 荷兰应用自然科学研究组织TNO | 2023-02-17 | — | — | CN | disclosed |
| EP-4120399-A1 | CONDUCTIVE MATERIAL DISPERSION, AND METHODS FOR MANUFACTURING POSITIVE ELECTRODE FOR LITHIUM ION SECONDARY BATTERY AND LITHIUM ION SECONDARY BATTERY USING SAME | Mikuni Shikiso Kabushiki Kaisha (JP) | 2023-01-18 | — | — | EP | disclosed |
| CN-115280556-A | Conductive material dispersion liquid, positive electrode for lithium ion secondary battery using same, and method for producing lithium ion secondary battery | 御国色素株式会社 | 2022-11-01 | — | — | CN | disclosed |
| CN-114982004-A | Conductive material dispersion liquid for positive electrode of lithium ion secondary battery and electrode slurry | 御国色素株式会社 | 2022-08-30 | — | — | CN | disclosed |
| US-6096479-A | IMAGE FORMING MATERIAL COMPRISES AN INFRARED LIGHT ABSORBING AGENT HAVING A HYDROPHOBIC GROUP WHICH CHANGES TO HYDROPHILIC DUE TO HEAT; CAN BE DIRECTLY PREPARED; LASER DECOMPOSES THE INFRARED LIGHT ABSORBING AGENT, GENERATING ACID | FUJI PHOTO FILM CO., LTD. (JP) | 2000-08-01 | — | — | US | disclosed |
| EP-0965885-A1 | INORGANIC-CONTAINING PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING INORGANIC PATTERN | Kansai Research Institute (JP) | 1999-12-22 | — | — | EP | disclosed |
| EP-0963789-A2 | Photocatalyst-containing coating composition | JAPAN as represented by DIRECTOR GENERAL OF AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 1999-12-15 | — | — | EP | disclosed |
| US-5981425-A | A PHOTOCATALYST CONTAINING CALCIUM PHOSPHATE AND TITANIUM OXIDE; PROTECTIVE COATING; WEATHERPROOFING, NONDESTRUCTIVE; DURABILITY AND OXIDATION RESISTANCE | AGENCY OF INDUSTRIAL SCIENCE & TECH. (JP) | 1999-11-09 | — | — | US | disclosed |
| EP-0938972-A1 | Photosensitive lithographic form plate using an image-forming material | FUJI PHOTO FILM CO., LTD. (JP) | 1999-09-01 | — | — | EP | disclosed |
| EP-0903224-A2 | Radiation-sensitive planographic plate | FUJI PHOTO FILM CO., LTD. (JP) | 1999-03-24 | — | — | EP | disclosed |