⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4752578 | 0.69 | — | — | |
| SCHEMBL2859859 | 0.69 | — | — | |
| Acrylic Acid SCHEMBL1169401 | 0.69 | — | — | |
| SCHEMBL12036083 | 0.69 | — | — | |
| Acrylic Acid SCHEMBL28146539 | 0.67 | — | — | |
| Acrylic Acid SCHEMBL2481347 | 0.67 | — | — | |
| SCHEMBL5515101 | 0.67 | — | — | |
| Acrylic Acid SCHEMBL5065665 | 0.65 | LMNA (1.00) | — | |
| Acrylic Acid SCHEMBL7706117 | 0.65 | LMNA (1.00) | — | |
| Acrylic Acid SCHEMBL11252224 | 0.65 | LMNA (1.00) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7955656-B2 | Hydrophilic member and process for producing the same | FUJIFILM CORPORATION (JP) | 2011-06-07 | — | — | US | disclosed |
| US-20110000658-A1 | HYDROPHILIC MEMBER | FUJIFILM CORPORATION (JP) | 2011-01-06 | — | — | US | disclosed |
| EP-2239137-A1 | HYDROPHILIC MEMBERS | FUJIFILM Corporation (JP) | 2010-10-13 | — | — | EP | disclosed |
| US-20100196724-A1 | HYDROPHILIC FILM FORMING COMPOSITION AND HYDROPHILIC MEMBER | FUJIFILM CORPORATION (JP) | 2010-08-05 | — | — | US | disclosed |
| EP-2194104-A1 | COMPOSITION FOR FORMATION OF HYDROPHILIC FILM, AND HYDROPHILIC MEMBER | Fujifilm Corporation (JP) | 2010-06-09 | — | — | EP | disclosed |
| US-20080292800-A1 | HYDROPHILIC MEMBER AND PROCESS FOR PRODUCING THE SAME | FUJIFILM CORPORATION (JP) | 2008-11-27 | — | — | US | disclosed |
| US-20080226928-A1 | HYDROPHILIC MEMBER AND PROCESS FOR PRODUCING THE SAME | FUJIFILM CORPORATION (JP) | 2008-09-18 | — | — | US | disclosed |
| EP-1970196-A2 | Hydrophilic member and process for producing the same | FUJIFILM Corporation (JP) | 2008-09-17 | — | — | EP | disclosed |
| EP-0709415-B1 | Substrat coated by a base-coat and a clear coat, method of film-forming and coated articles | NOF CORP (JP) | 2001-07-25 | — | — | EP | disclosed |