SCHEMBL9636205

SCHEMBL9636205

CCOc1cc(CC)cc(C(N)=O)c1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PARP10 Q53GL7 3/20 0.56
TSHR P16473 1/20 0.53
LMNA P02545 1/20 0.46
HTT P42858 1/20 0.46
NCOA1 Q15788 1/20 0.44
NCOA3 Q9Y6Q9 1/20 0.44
BPTF Q12830 1/20 0.44
MAPK1 P28482 1/20 0.44
ALDH1A1 P00352 2/20 0.44
MEN1 O00255 2/20 0.42
KMT2A Q03164 2/20 0.42
TP53 P04637 1/20 0.41
PKM P14618 1/20 0.41
NFKB1 P19838 1/20 0.41
NFKB2 Q00653 1/20 0.41
RELA Q04206 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
MRGPRX4 Q96LA9 1/20 0.41
KDM4E B2RXH2 1/20 0.41
PRSS1 P07477 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4262945 0.87 PARP10 (0.66) PARP10TSHRLMNAHTTNCOA1
SCHEMBL20758871 0.87 PARP10 (0.66) PARP10TSHRLMNAHTTNCOA1
SCHEMBL11425822 0.84 PARP1 (0.51) PARP10TSHRHTTNCOA1NCOA3
SCHEMBL31359135 0.84 SMN1; SMN2 (0.53) TSHRHTTALDH1A1MEN1KMT2A
SCHEMBL25236496 0.84 SMN1; SMN2 (0.53) TSHRHTTALDH1A1MEN1KMT2A
SCHEMBL28995855 0.81 PARP10 (0.54) PARP10TSHRLMNAHTTNCOA1
SCHEMBL1004651 0.81 RXRA (0.47) PARP10TSHRLMNAHTTNCOA1
SCHEMBL7902893 0.81 TSHR (0.47) PARP10TSHRLMNAHTTNCOA1
SCHEMBL32662332 0.81 PARP10 (0.58) PARP10TSHRLMNAHTTNCOA1
SCHEMBL22946249 0.81 PARP10 (0.58) PARP10TSHRLMNAHTTNCOA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0256820-B1 THERMAL DEVELOPING LIGHT-SENSITIVE MATERIAL KONICA CORPORATION (JP) 1992-07-29 EP disclosed
US-5032499-A High density, stability KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1991-07-16 US disclosed
EP-0256820-A2 Thermal developing light-sensitive material KONICA CORPORATION (JP) 1988-02-24 EP disclosed