SCHEMBL963760

SCHEMBL963760

C=C(C)COC(=O)CCCCCCCCCC[Si](OC)(OC)OC

nearest known ligand 0.41

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
PAM P19021 2/20 0.41
DGKA P23743 1/20 0.37
TSHR P16473 1/20 0.36
ALDH1A1 P00352 1/20 0.34
LMNA P02545 1/20 0.34
PRSS1 P07477 1/20 0.34
PRSS2 P07478 1/20 0.34
PRSS3 P35030 1/20 0.34
TRPV1 Q8NER1 7/20 0.33
MAPT P10636 1/20 0.33
LPAR6 P43657 3/20 0.32
LPAR1 Q92633 3/20 0.32
LPAR4 Q99677 3/20 0.32
LPAR5 Q9H1C0 3/20 0.32
LPAR2 Q9HBW0 3/20 0.32
LPAR3 Q9UBY5 3/20 0.32
ENPP2 Q13822 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL959633 0.86 PAM (0.40) PAMDGKATSHRALDH1A1LMNA
SCHEMBL17169822 0.82 PAM (0.50) PAMDGKATSHRALDH1A1LMNA
SCHEMBL1333815 0.78 PAM (0.67) PAMDGKATSHRALDH1A1LMNA
SCHEMBL3503863 0.78 PAM (0.67) PAMDGKATSHRALDH1A1LMNA
SCHEMBL3504013 0.78 PAM (0.67) PAMDGKATSHRALDH1A1LMNA
SCHEMBL3504002 0.78 PAM (0.47) PAMDGKATSHRALDH1A1LMNA
SCHEMBL3503950 0.78 PAM (0.67) PAMDGKATSHRALDH1A1LMNA
SCHEMBL3504155 0.78 PAM (0.67) PAMDGKATSHRALDH1A1LMNA
SCHEMBL3503528 0.78 PAM (0.67) PAMDGKATSHRALDH1A1LMNA
SCHEMBL960627 0.77 TSHR (0.63) PAMDGKATSHRALDH1A1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3340252-A1 ELECTRODE ASSEMBLY Solvay SA (BE) 2018-06-27 EP claimed
EP-3340253-A1 UV-RESISTANT ELECTRODE ASSEMBLY Solvay SA (BE) 2018-06-27 EP claimed
US-10589494-B2 Far infrared reflective film, dispersion for forming far infrared reflective film, manufacturing method of far infrared reflective film, far infrared reflective glass, and window FUJIFILM CORPORATION (JP) 2020-03-17 US disclosed
EP-3340253-A1 UV-RESISTANT ELECTRODE ASSEMBLY Solvay SA (BE) 2018-06-27 EP disclosed
EP-3340252-A1 ELECTRODE ASSEMBLY Solvay SA (BE) 2018-06-27 EP disclosed
US-20180079917-A1 HEAT INSULATION PAINT FUJIFILM CORPORATION (JP) 2018-03-22 US disclosed
CN-107735470-A Adiabatic coating 富士胶片株式会社 2018-02-23 CN disclosed
US-20170320302-A1 FAR INFRARED REFLECTIVE FILM, DISPERSION FOR FORMING FAR INFRARED REFLECTIVE FILM, MANUFACTURING METHOD OF FAR INFRARED REFLECTIVE FILM, FAR INFRARED REFLECTIVE GLASS, AND WINDOW FUJIFILM CORPORATION (JP) 2017-11-09 US disclosed
CN-103597550-B Electroconductive member, the manufacture method of electroconductive member, constituent, touch-screen and solar cell 富士胶片株式会社 2017-06-30 CN disclosed
CN-103503081-B Electroconductive member, its manufacture method, touch screen and solar cell 富士胶片株式会社 2016-11-23 CN disclosed
CN-104205247-B Conductive member and method for producing same FUJIFILM CORP. (JP) 2015-09-16 CN disclosed
US-20140034360-A1 CONDUCTIVE MEMBER, PRODUCTION METHOD OF THE SAME, TOUCH PANEL, AND SOLAR CELL FUJIFILM CORPORATION (JP) 2014-02-06 US disclosed
CN-103503081-A Conductive member, method for producing same, touch panel and solar cell FUJI PHOTO FILM CO LTD 2014-01-08 CN disclosed
CN-103493147-A Conductive member, method for producing conductive member, touch panel, and solar cell FUJI PHOTO FILM CO LTD 2014-01-01 CN disclosed
US-20110000658-A1 HYDROPHILIC MEMBER FUJIFILM CORPORATION (JP) 2011-01-06 US disclosed
EP-2239137-A1 HYDROPHILIC MEMBERS FUJIFILM Corporation (JP) 2010-10-13 EP disclosed
CN-100363177-C Coating composition for inkjet recording medium and inkjet recording medium CLARIANT INT LTD (JP) 2008-01-23 CN disclosed
CN-1697737-A Coating composition for inkjet recording medium and inkjet recording medium CLARIANT INT LTD (CH) 2005-11-16 CN disclosed
US-20050124747-A1 Coating composition for ink-jet recording medium and ink-jet recording medium DEUTSCHE BANK AG, NEW YORK BRANCH, AS COLLATERAL AGENT 2005-06-09 US disclosed
EP-1470928-A1 COATING COMPOSITION FOR INK-JET RECORDING MEDIUM AND INK-JET RECORDING MEDIUM Clariant International Ltd. (CH) 2004-10-27 EP disclosed