SCHEMBL9645575

SCHEMBL9645575

[Au].[Be].[Si]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9645568 1.00
SCHEMBL28328690 0.82
SCHEMBL771068 0.82
SCHEMBL771067 0.82
SCHEMBL30522790 0.82
SCHEMBL28117271 0.82
SCHEMBL30529990 0.82
SCHEMBL29378485 0.82
SCHEMBL4948743 0.67
SCHEMBL10721912 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102568989-B There is the charged particle source of multiple optional particle emitter FEI CO. (US) 2016-12-14 CN disclosed
EP-2472556-B1 Electron beam system having an electron source with multiple selectable electron emitters FEI CO (US) 2016-11-09 EP disclosed
US-8710453-B2 Charged particle source with multiple selectable particle emitters FEI COMPANY (US) 2014-04-29 US disclosed
US-20120168638-A1 Charged Particle Source with Multiple Selectable Particle Emitters FEI COMPANY (US) 2012-07-05 US disclosed
EP-2472556-A2 Charged particle source with multiple selectable particle emitters FEI Company (US) 2012-07-04 EP disclosed
US-5083033-A Method of depositing an insulating film and a focusing ion beam apparatus KABUSHIKI KAISHA TOSHIBA (JP) 1992-01-21 US disclosed