SCHEMBL9645846

SCHEMBL9645846

Nc1ccc(Oc2ccc(C(=O)O)c(C(=O)O)c2)cc1

nearest known ligand 0.63

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 2/20 0.63
ALDH1A1 P00352 7/20 0.53
TDP1 Q9NUW8 4/20 0.52
CYP3A4 P08684 2/20 0.52
TSHR P16473 1/20 0.52
MAPT P10636 3/20 0.52
GAA P10253 2/20 0.52
MEN1 O00255 2/20 0.52
KMT2A Q03164 2/20 0.52
SMN1; SMN2 Q16637 2/20 0.52
MITF O75030 1/20 0.52
GFER P55789 1/20 0.52
NLRP1 Q9C000 1/20 0.52
NOD2 Q9HC29 1/20 0.52
PARP10 Q53GL7 1/20 0.52
APEX1 P27695 1/20 0.50
CTDSP1 Q9GZU7 1/20 0.50
L3MBTL1 Q9Y468 1/20 0.50
HPSE Q9Y251 1/20 0.50
MAOA P21397 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29406842 0.90 POLB (0.73) POLBALDH1A1TDP1MEN1KMT2A
SCHEMBL30553345 0.90 POLB (0.73) POLBALDH1A1TDP1MEN1KMT2A
SCHEMBL262311 0.90 POLB (0.73) POLBALDH1A1TDP1MEN1KMT2A
SCHEMBL30901880 0.90 POLB (0.73) POLBALDH1A1TDP1MEN1KMT2A
SCHEMBL145176 0.90 POLB (0.73) POLBALDH1A1TDP1MEN1KMT2A
SCHEMBL29426403 0.88 POLB (0.70) POLBALDH1A1TDP1MEN1KMT2A
SCHEMBL49365 0.88 POLB (0.70) POLBALDH1A1TDP1MEN1KMT2A
SCHEMBL29364655 0.88 POLB (0.70) POLBALDH1A1TDP1MEN1KMT2A
SCHEMBL1027446 0.87 KMT2A (0.61) POLBALDH1A1TDP1CYP3A4TSHR
Water SCHEMBL6407539 0.86 POLB (0.68) POLBALDH1A1TDP1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0255037-B1 A METHOD FOR FORMING POLYIMIDE FILM BY CHEMICAL VAPOR DEPOSITION HITACHI, LTD. (JP) 1992-12-09 EP claimed
US-4759958-A Method for forming polyimide film by chemical vapor deposition HITACHI, LTD. (JP) 1988-07-26 US claimed
EP-0255037-A2 A method for forming polyimide film by chemical vapor deposition HITACHI, LTD. (JP) 1988-02-03 EP claimed
EP-0255037-B1 A METHOD FOR FORMING POLYIMIDE FILM BY CHEMICAL VAPOR DEPOSITION HITACHI, LTD. (JP) 1992-12-09 EP disclosed
US-4759958-A Method for forming polyimide film by chemical vapor deposition HITACHI, LTD. (JP) 1988-07-26 US disclosed
EP-0255037-A2 A method for forming polyimide film by chemical vapor deposition HITACHI, LTD. (JP) 1988-02-03 EP disclosed
US-4208505-A PRODUCTION OF LAMINATES OR COMPOSITE MATERIALS CENTRE NATIONAL D'ETUDES SPATIALES (FR) 1980-06-17 US disclosed
US-3946011-A S-Triazine tetracarboxylic acids and dianhydrides CIBA-GEIGY CORPORATION (US) 1976-03-23 US disclosed