SCHEMBL9645867

SCHEMBL9645867

Nc1ccc(C(=O)c2ccc(C(=O)O)c(C(=O)O)c2)cc1

nearest known ligand 0.70

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 4/20 0.70
TDP1 Q9NUW8 4/20 0.70
L3MBTL1 Q9Y468 1/20 0.70
HSD17B10 Q99714 2/20 0.61
CDC25B P30305 2/20 0.61
CDC25A P30304 1/20 0.61
KDM4E B2RXH2 3/20 0.55
ALDH1A1 P00352 4/20 0.50
MAPT P10636 3/20 0.50
CYP3A4 P08684 2/20 0.50
GAA P10253 1/20 0.50
ESR2 Q92731 1/20 0.50
PTPN1 P18031 1/20 0.50
PBRM1 Q86U86 1/20 0.48
SRD5A2 P31213 4/20 0.46
MEN1 O00255 2/20 0.46
THRB P10828 2/20 0.46
RECQL P46063 2/20 0.46
KMT2A Q03164 2/20 0.46
USP2 O75604 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29440676 0.90 TDP1 (0.84) POLBTDP1L3MBTL1HSD17B10CDC25B
SCHEMBL30754379 0.90 TDP1 (0.84) POLBTDP1L3MBTL1HSD17B10CDC25B
SCHEMBL203260 0.90 TDP1 (0.84) POLBTDP1L3MBTL1HSD17B10CDC25B
SCHEMBL7045921 0.90 TDP1 (0.84) POLBTDP1L3MBTL1HSD17B10CDC25B
SCHEMBL29404709 0.88 POLB (0.80) POLBTDP1L3MBTL1HSD17B10CDC25B
SCHEMBL48886 0.88 POLB (0.80) POLBTDP1L3MBTL1HSD17B10CDC25B
SCHEMBL6866245 0.86 POLB (0.78) POLBTDP1L3MBTL1HSD17B10CDC25B
SCHEMBL29432854 0.86 POLB (0.78) POLBTDP1L3MBTL1HSD17B10CDC25B
SCHEMBL6693862 0.86 POLB (0.77) POLBTDP1L3MBTL1HSD17B10CDC25B
SCHEMBL268918 0.86 POLB (0.77) POLBTDP1L3MBTL1HSD17B10CDC25B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0255037-B1 A METHOD FOR FORMING POLYIMIDE FILM BY CHEMICAL VAPOR DEPOSITION HITACHI, LTD. (JP) 1992-12-09 EP claimed
US-4759958-A Method for forming polyimide film by chemical vapor deposition HITACHI, LTD. (JP) 1988-07-26 US claimed
EP-0255037-B1 A METHOD FOR FORMING POLYIMIDE FILM BY CHEMICAL VAPOR DEPOSITION HITACHI, LTD. (JP) 1992-12-09 EP disclosed
US-4759958-A Method for forming polyimide film by chemical vapor deposition HITACHI, LTD. (JP) 1988-07-26 US disclosed
US-3946011-A S-Triazine tetracarboxylic acids and dianhydrides CIBA-GEIGY CORPORATION (US) 1976-03-23 US disclosed