⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5500422 | 0.81 | — | — | |
| SCHEMBL4442953 | 0.81 | — | — | |
| SCHEMBL5945171 | 0.73 | — | — | |
| SCHEMBL1505665 | 0.72 | — | — | |
| SCHEMBL9019666 | 0.65 | — | — | |
| SCHEMBL19091768 | 0.65 | — | — | |
| SCHEMBL603469 | 0.65 | — | — | |
| SCHEMBL2844256 | 0.64 | — | — | |
| SCHEMBL4023582 | 0.64 | — | — | |
| SCHEMBL6057186 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112045555-B | Method and apparatus for forming advanced polishing pads using additive manufacturing processes | 应用材料公司 | 2022-12-30 | — | — | CN | disclosed |
| CN-112045557-B | Method and apparatus for forming advanced polishing pads using additive manufacturing processes | 应用材料公司 | 2022-11-01 | — | — | CN | disclosed |
| CN-112059937-B | Method and apparatus for forming advanced polishing pads using additive manufacturing processes | 应用材料公司 | 2022-11-01 | — | — | CN | disclosed |
| CN-112025544-B | Method and apparatus for forming advanced polishing pads using additive manufacturing processes | 应用材料公司 | 2022-11-01 | — | — | CN | disclosed |
| WO-2021137632-A1 | DOUBLE METAL CYANIDE CATALYST, PREPARATION METHOD THEREFOR, AND METHOD FOR PREPARING POLYOL | 부산대학교산학협력단 | 2021-07-08 | — | — | WO | disclosed |
| US-9093709-B2 | Electrode materials for electrical cells | BASF SE (DE) | 2015-07-28 | — | — | US | disclosed |
| US-9093709-B2 | Electrode materials for electrical cells | BASF SE (DE) | 2015-07-28 | — | — | US | disclosed |
| US-20150044548-A1 | ELECTRODE MATERIALS FOR ELECTRICAL CELLS | BASF SE (DE) | 2015-02-12 | — | — | US | disclosed |
| US-20150044548-A1 | ELECTRODE MATERIALS FOR ELECTRICAL CELLS | BASF SE (DE) | 2015-02-12 | — | — | US | disclosed |
| WO-2013144842-A1 | ELECTROCHEMICAL CELL COMPRISING SULFUR-CONTAINING POLYMER | BASF SE (DE) | 2013-10-03 | — | — | WO | disclosed |
| US-4740516-A | Substituted t-butanol fungicidal agents | BAYER AKTIENGESELLSCHAFT (DE) | 1988-04-26 | — | — | US | disclosed |
| US-4668660-A | HYDROXYETHYLAZOLYL DERIVATIVES | BAYER AKTIENGESELLSCHAFT (DE) | 1987-05-26 | — | — | US | disclosed |
| EP-0105166-B1 | SUBSTITUTED TERT. BUTANOL DERIVATIVES, METHOD FOR THEIR PREPARATION AND ANTIMYCOTIC AGENTS CONTAINING THEM | BAYER AG (DE) | 1987-04-22 | — | — | EP | disclosed |
| US-4621095-A | BIS-AZOLYL-SUBSTITUTED TERT-BUTANOL DERIVATIVES | BAYER AKTIENGESELLSCHAFT (DE) | 1986-11-04 | — | — | US | disclosed |
| US-4618619-A | Substituted t-butanol fungicidal agents | BAYER AKTIENGESELLSCHAFT (DE) | 1986-10-21 | — | — | US | disclosed |
| EP-0147758-A2 | Polyesters modified with polymers of alkylene oxids | The B.F. GOODRICH Company (US) | 1985-07-10 | — | — | EP | disclosed |
| EP-0132508-A2 | Hydroxyethyl-azolyl derivatives, their use and antiviral agents containing them | BAYER AG (DE) | 1985-02-13 | — | — | EP | disclosed |
| EP-0121171-A2 | Fungicides, process for their preparation and their use | BAYER AG (DE) | 1984-10-10 | — | — | EP | disclosed |
| EP-0105166-A1 | Substituted tert. butanol derivatives, method for their preparation and antimycotic agents containing them | BAYER AG (DE) | 1984-04-11 | — | — | EP | disclosed |
| US-3957697-A | Process for slurry polymerization of propylene oxide with high catalyst efficiency | THE B. F. GOODRICH COMPANY (US) | 1976-05-18 | — | — | US | disclosed |