SCHEMBL5500422

SCHEMBL5500422

CCC1(CCl)CO1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL965869 0.81
SCHEMBL179683 0.81
SCHEMBL4023582 0.78
SCHEMBL27842206 0.78
SCHEMBL2844256 0.78
SCHEMBL28282111 0.78
SCHEMBL5945171 0.74
SCHEMBL7860908 0.72 ALDH1A1 (0.35)
SCHEMBL29108037 0.71 ALDH1A1 (0.39)
SCHEMBL7388302 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 157 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119819486-A Dust collecting plate for horizontal wet type electric power washing tower and preparation method thereof 苏州艾特斯环保设备有限公司 2025-04-15 CN claimed
CN-119708491-A Polydisulfide polymer material containing hydroxy ester group and preparation method thereof 衢州化工新材料创新研究院 2025-03-28 CN claimed
CN-118594265-B Ceramic membrane cleaning method and application thereof 苏州芯合半导体材料有限公司 2024-12-06 CN claimed
CN-118594265-A Ceramic membrane cleaning method and application thereof 苏州芯合半导体材料有限公司 2024-09-06 CN claimed
EP-3124513-B1 GRAFT POLYMER AND METHOD FOR PRODUCING SAME NITTO BOSEKI CO LTD (JP) 2020-04-22 EP claimed
CN-106133013-B Graft polymers and its manufacturing method 日东纺绩株式会社 2018-11-09 CN claimed
US-12297318-B2 Curable resin composition CANON KABUSHIKI KAISHA (JP) 2025-05-13 US disclosed
CN-119819486-A Dust collecting plate for horizontal wet type electric power washing tower and preparation method thereof 苏州艾特斯环保设备有限公司 2025-04-15 CN disclosed
CN-119836417-A Compound and method for producing same 住友化学株式会社 2025-04-15 CN disclosed
CN-119816486-A Compound and method for producing same 住友化学株式会社 2025-04-11 CN disclosed
CN-119708491-A Polydisulfide polymer material containing hydroxy ester group and preparation method thereof 衢州化工新材料创新研究院 2025-03-28 CN disclosed
WO-2025028284-A1 RESIN COMPOSITION, CURED ARTICLE, AND METHOD FOR PRODUCING CURED ARTICLE 株式会社ADEKA 2025-02-06 WO disclosed
CN-118594265-B Ceramic membrane cleaning method and application thereof 苏州芯合半导体材料有限公司 2024-12-06 CN disclosed
US-4246147-A Screenable and strippable solder mask and use thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1981-01-20 US disclosed
EP-0019802-A2 Soldering mask composition to be processed by a screen printing process and subsequently removed and process for producing a removable soldering mask International Business Machines Corporation (US) 1980-12-10 EP disclosed
US-4237216-A Photosensitive patternable coating composition containing novolak type materials INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1980-12-02 US disclosed
US-4232090-A Sealerless primers PPG INDUSTRIES, INC. (US) 1980-11-04 US disclosed
EP-0009190-A1 Curable composition useful for screen-printing, a cured coating comprising said composition and process for soldering printed circuit boards using said composition International Business Machines Corporation (US) 1980-04-02 EP disclosed
US-4187258-A AMINOPLAST CURING AGENT; POLYESTER, POLYETHER, OR POLYURETHANE, THERMOPLASTIC ACRYLIC RESIN PPG INDUSTRIES, INC. (US) 1980-02-05 US disclosed
US-3950451-A COUPLED PRODUCT OF ALKYLPHENOL AND PHENOL-FORMALDEHYDE-DIAMINE CONDENSATE ASAHI DENKA KOGYO K.K. (JA) 1976-04-13 US disclosed