Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTT | P42858 | 2/20 | 0.55 |
| ▸ | GPR84 | Q9NQS5 | 8/20 | 0.54 |
| ▸ | SPHK1 | Q9NYA1 | 2/20 | 0.52 |
| ▸ | FFAR1 | O14842 | 2/20 | 0.52 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.52 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.48 |
| ▸ | LMNA | P02545 | 2/20 | 0.48 |
| ▸ | GMNN | O75496 | 1/20 | 0.48 |
| ▸ | POLB | P06746 | 1/20 | 0.48 |
| ▸ | THPO | P40225 | 1/20 | 0.48 |
| ▸ | MTOR | P42345 | 1/20 | 0.48 |
| ▸ | BLM | P54132 | 1/20 | 0.48 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.48 |
| ▸ | TP53 | P04637 | 1/20 | 0.48 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.48 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.48 |
| ▸ | MAPT | P10636 | 1/20 | 0.48 |
| ▸ | CETP | P11597 | 1/20 | 0.48 |
| ▸ | UBE2N | P61088 | 1/20 | 0.48 |
| ▸ | PSMD14 | O00487 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL382200 | 1.00 | HTT (0.55) | HTTGPR84SPHK1FFAR1FFAR4 | |
| SCHEMBL16390390 | 1.00 | HTT (0.55) | HTTGPR84SPHK1FFAR1FFAR4 | |
| SCHEMBL16390024 | 1.00 | HTT (0.55) | HTTGPR84SPHK1FFAR1FFAR4 | |
| SCHEMBL11676992 | 1.00 | HTT (0.55) | HTTGPR84SPHK1FFAR1FFAR4 | |
| SCHEMBL10399683 | 1.00 | HTT (0.55) | HTTGPR84SPHK1FFAR1FFAR4 | |
| SCHEMBL16390157 | 1.00 | HTT (0.55) | HTTGPR84SPHK1FFAR1FFAR4 | |
| SCHEMBL16390108 | 1.00 | HTT (0.55) | HTTGPR84SPHK1FFAR1FFAR4 | |
| SCHEMBL16389901 | 1.00 | HTT (0.55) | HTTGPR84SPHK1FFAR1FFAR4 | |
| SCHEMBL380548 | 1.00 | HTT (0.55) | HTTGPR84SPHK1FFAR1FFAR4 | |
| SCHEMBL967490 | 1.00 | HTT (0.55) | HTTGPR84SPHK1FFAR1FFAR4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 260 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12325844-B2 | Photoresist remover | VERSUM MATERIALS US, LLC (US) | 2025-06-10 | — | — | US | claimed |
| WO-2025108836-A1 | COMPOSITIONS FOR REMOVING PHOTORESIST AND ETCH RESIDUES, METHODS OF USING AND USE THEREOF | MERCK PATENT GMBH (DE) | 2025-05-30 | — | — | WO | claimed |
| CN-118223024-A | Etching solution for copper thick film | 松下知识产权经营株式会社 | 2024-06-21 | — | — | CN | claimed |
| CN-112859552-B | Application of vanadium oxide corrosion inhibition fluorine-containing stripping liquid | 上海新阳半导体材料股份有限公司 | 2024-01-05 | — | — | CN | claimed |
| CN-112859554-B | Preparation method of vanadium oxide corrosion inhibition fluorine-containing stripping liquid | 上海新阳半导体材料股份有限公司 | 2023-11-10 | — | — | CN | claimed |
| CN-112859553-B | Vanadium oxide corrosion inhibition fluorine-containing stripping solution | 上海新阳半导体材料股份有限公司 | 2023-11-10 | — | — | CN | claimed |
| WO-2023196800-A2 | EPOXIDE-MODIFIED-SORBENTS, SYSTEMS INCLUDING EPOXIDE-MODIFIED-SORBENTS, AND METHODS USING THE EPOXIDE-MODIFIED-SORBENTS | GLOBAL THERMOSTAT OPERATIONS, LLC. (US) | 2023-10-12 | — | — | WO | claimed |
| CN-110361941-B | Positive photoresist stripping liquid, preparation method and application thereof | 上海新阳半导体材料股份有限公司 | 2023-02-03 | — | — | CN | claimed |
| US-20220333044-A1 | Photoresist Remover | VERSUM MATERIALS US, LLC (US) | 2022-10-20 | — | — | US | claimed |
| EP-4038173-A1 | PHOTORESIST REMOVER | Versum Materials US, LLC (US) | 2022-08-10 | — | — | EP | claimed |
| US-8987181-B2 | Photoresist and post etch residue cleaning solution | DYNALOY, LLC (US) | 2015-03-24 | — | — | US | claimed |
| EP-2758507-A1 | PROCESS AND COMPOSITION FOR REMOVING SUBSTANCES FROM SUBSTRATES | Dynaloy, LLC (US) | 2014-07-30 | — | — | EP | claimed |
| WO-2014081465-A1 | PROCESS AND COMPOSITION FOR REMOVING SUBSTANCES FROM SUBSTRATES | DYNALOY, LLC (US) | 2014-05-30 | — | — | WO | claimed |
| US-20140142017-A1 | Process And Composition For Removing Substances From Substrates | DYNALOY, LLC (US) | 2014-05-22 | — | — | US | claimed |
| EP-1031884-B1 | Resist stripping agent and process of producing semiconductor devices using the same | MITSUBISHI GAS CHEMICAL CO (JP) | 2012-01-11 | — | — | EP | claimed |
| US-7968507-B2 | Composition for stripping and stripping method | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-06-28 | — | — | US | claimed |
| US-20090084406-A1 | Composition for stripping and stripping method | SAMSUNG ELECTRONICS CO., LTD. | 2009-04-02 | — | — | US | claimed |
| US-20060165814-A1 | Amines, combination of amines and vanadium and amine vanadium salts for the treatment or prevention of dyslipidemia | GENMEDICA THERAPEUTICS SL (ES) | 2006-07-27 | — | — | US | claimed |
| US-4925582-A | USING ALKYL ALKANOLAMINE | OXID, INCORPORATED (US) | 1990-05-15 | — | — | US | claimed |
| US-4749503-A | N-HEXYL ETHANOLAMINE, LUBRICANTS AND WATER MIXED | CHEMICAL EXCHANGE INDUSTRIES, INC. (US) | 1988-06-07 | — | — | US | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20060165814-A1 | Amines, combination of amines and vanadium and amine vanadium salts for the treatment or prevention of dyslipidemia | COMT, PCSK9, OAT | HTT 1358/4885GPR84 1528/4885SPHK1 2283/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.