⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9682807 | 1.00 | — | — | |
| SCHEMBL9682772 | 1.00 | — | — | |
| SCHEMBL9683309 | 1.00 | — | — | |
| SCHEMBL28418316 | 1.00 | — | — | |
| SCHEMBL28413450 | 1.00 | — | — | |
| SCHEMBL9682244 | 1.00 | — | — | |
| SCHEMBL28416091 | 1.00 | — | — | |
| SCHEMBL25400251 | 0.98 | — | — | |
| SCHEMBL333712 | 0.91 | — | — | |
| SCHEMBL929338 | 0.88 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4159740-B1 | CYCLIC SILAZANE COMPOUND HAVING ALKOXYSILYL GROUP, METHOD FOR PRODUCING SAME, AND COMPOSITION, CURED PRODUCT AND COVERED SUBSTRATE CONTAINING SAME | SHINETSU CHEMICAL CO (JP) | 2025-10-29 | — | — | EP | disclosed |
| US-12071562-B2 | Cyclic silazane compound having alkoxysilyl group, method for producing same, and composition, cured product and covered substrate containing same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-08-27 | — | — | US | disclosed |
| US-20230108908-A1 | CYCLIC SILAZANE COMPOUND HAVING ALKOXYSILYL GROUP, METHOD FOR PRODUCING SAME, AND COMPOSITION, CURED PRODUCT AND COVERED SUBSTRATE CONTAINING SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-06 | — | — | US | disclosed |
| EP-4159740-A1 | CYCLIC SILAZANE COMPOUND HAVING ALKOXYSILYL GROUP, METHOD FOR PRODUCING SAME, AND COMPOSITION, CURED PRODUCT AND COVERED SUBSTRATE CONTAINING SAME | Shin-Etsu Chemical Co., Ltd. (JP) | 2023-04-05 | — | — | EP | disclosed |
| CN-115873030-A | Cyclic silazane compound having alkoxysilyl group, process for producing the same, composition containing the same, cured product, and coated substrate | 信越化学工业株式会社 | 2023-03-31 | — | — | CN | disclosed |
| CN-111233916-A | Long carbon chain sulfur-containing silane coupling agent, and preparation method and application thereof | 南京曙光精细化工有限公司 | 2020-06-05 | — | — | CN | disclosed |
| US-10323049-B2 | Organosilicon compound containing isocyanate group, process for producing same, adhesive, pressure-sensitive adhesive, and coating material | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-06-18 | — | — | US | disclosed |
| US-20170349614-A1 | ORGANOSILICON COMPOUND CONTAINING ISOCYANATE GROUP, PROCESS FOR PRODUCING SAME, ADHESIVE, PRESSURE-SENSITIVE ADHESIVE, AND COATING MATERIAL | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-12-07 | — | — | US | disclosed |
| EP-3239158-A1 | ORGANOSILICON COMPOUND CONTAINING ISOCYANATE GROUP, PROCESS FOR PRODUCING SAME, ADHESIVE, PRESSURE-SENSITIVE ADHESIVE, AND COATING MATERIAL | Shin-Etsu Chemical Co., Ltd. (JP) | 2017-11-01 | — | — | EP | disclosed |
| EP-0491622-A1 | Novel organosilicon compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1992-06-24 | — | — | EP | disclosed |