SCHEMBL9686386

SCHEMBL9686386

ClC(Cl)(Cl)c1nnc(-c2ccc(/C=C/c3ccccc3)cc2)o1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 6/20 0.52
HPGD P15428 5/20 0.52
NPC1 O15118 11/20 0.49
RAB9A P51151 11/20 0.49
KDM4E B2RXH2 5/20 0.49
MAPT P10636 3/20 0.45
CYP1A2 P05177 2/20 0.45
CYP2C9 P11712 2/20 0.45
CYP3A4 P08684 1/20 0.45
PTGS2 P35354 2/20 0.43
NFKB1 P19838 2/20 0.41
NFKB2 Q00653 2/20 0.41
RELA Q04206 2/20 0.41
POLB P06746 1/20 0.41
MEN1 O00255 1/20 0.41
KMT2A Q03164 1/20 0.41
ALDH1A1 P00352 4/20 0.40
HSD17B10 Q99714 2/20 0.40
GLA P06280 1/20 0.40
ALOX15 P16050 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9686391 1.00 SMN1; SMN2 (0.52) SMN1; SMN2HPGDNPC1RAB9AKDM4E
SCHEMBL195055 0.85 NPC1 (0.61) SMN1; SMN2HPGDNPC1RAB9AKDM4E
SCHEMBL22504936 0.84 SMN1; SMN2 (0.50) SMN1; SMN2HPGDNPC1RAB9AKDM4E
SCHEMBL22504938 0.84 SMN1; SMN2 (0.50) SMN1; SMN2HPGDNPC1RAB9AKDM4E
SCHEMBL5191429 0.83 SMN1; SMN2 (0.65) SMN1; SMN2HPGDNPC1RAB9AKDM4E
SCHEMBL5191434 0.83 SMN1; SMN2 (0.65) SMN1; SMN2HPGDNPC1RAB9AKDM4E
SCHEMBL14577297 0.83 NPC1 (0.46) SMN1; SMN2HPGDNPC1RAB9AKDM4E
SCHEMBL14881652 0.81 NPC1 (0.68) SMN1; SMN2HPGDNPC1RAB9AKDM4E
SCHEMBL14881653 0.81 NPC1 (0.68) SMN1; SMN2HPGDNPC1RAB9AKDM4E
SCHEMBL321609 0.81 HPGD (0.48) SMN1; SMN2HPGDNPC1RAB9AKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-60239473-A None JP disclosed
US-20210382390-A1 NOVOLAK/DNQ BASED, CHEMICALLY AMPLIFIED PHOTORESIST MERCK PERFORMANCE MATERIALS GERMANY GMBH (DE) 2021-12-09 US disclosed
US-5171655-A Acrylic esters or amides containing pendant maleimide groups; photoresists; short exposure times using scanning laser rays; workability FUJI PHOTO FILM CO., LTD. (JP) 1992-12-15 US disclosed
US-4950582-A CONTAINING POLYURETHANE CONTAINING N-AMINOSULFONYLAMIDO GROUP FUJI PHOTO FILM CO., LTD. (JP) 1990-08-21 US disclosed
US-4877711-A DURABLE PRINTING PLATES FUJI PHOTO FILM CO., LTD. (JP) 1989-10-31 US disclosed
JP-S60239473-A 2-TRIHALOMETHYL-5-PENYL-1,3,4-OXADIAZOLE COMPOUND FUJI PHOTO FILM CO LTD 1985-11-28 JP disclosed