Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPC1 | O15118 | 11/20 | 0.61 |
| ▸ | RAB9A | P51151 | 11/20 | 0.61 |
| ▸ | SMN1; SMN2 | Q16637 | 5/20 | 0.61 |
| ▸ | NOTUM | Q6P988 | 4/20 | 0.52 |
| ▸ | ATAD2 | Q6PL18 | 1/20 | 0.52 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.52 |
| ▸ | LMNA | P02545 | 1/20 | 0.52 |
| ▸ | HPGD | P15428 | 5/20 | 0.50 |
| ▸ | NFKB1 | P19838 | 2/20 | 0.50 |
| ▸ | NFKB2 | Q00653 | 2/20 | 0.50 |
| ▸ | RELA | Q04206 | 2/20 | 0.50 |
| ▸ | TSHR | P16473 | 2/20 | 0.50 |
| ▸ | POLB | P06746 | 1/20 | 0.50 |
| ▸ | MEN1 | O00255 | 1/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.50 |
| ▸ | TP53 | P04637 | 1/20 | 0.50 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.48 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.48 |
| ▸ | GLA | P06280 | 1/20 | 0.48 |
| ▸ | MAPT | P10636 | 1/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14577297 | 0.90 | NPC1 (0.46) | NPC1RAB9ASMN1; SMN2NOTUMALDH1A1 | |
| SCHEMBL9686391 | 0.85 | SMN1; SMN2 (0.52) | NPC1RAB9ASMN1; SMN2NOTUMATAD2 | |
| SCHEMBL9686386 | 0.85 | SMN1; SMN2 (0.52) | NPC1RAB9ASMN1; SMN2NOTUMATAD2 | |
| SCHEMBL196021 | 0.82 | RAB9A (0.56) | NPC1RAB9ASMN1; SMN2NOTUMALDH1A1 | |
| SCHEMBL11219347 | 0.82 | NPC1 (0.43) | NPC1RAB9ASMN1; SMN2NOTUMALDH1A1 | |
| SCHEMBL195264 | 0.82 | NPC1 (0.64) | NPC1RAB9ASMN1; SMN2NOTUMATAD2 | |
| SCHEMBL308805 | 0.81 | NPC1 (0.56) | NPC1RAB9ASMN1; SMN2NOTUMALDH1A1 | |
| SCHEMBL10226381 | 0.81 | RAB9A (0.64) | NPC1RAB9ASMN1; SMN2NOTUMALDH1A1 | |
| SCHEMBL3858280 | 0.80 | RAB9A (0.61) | NPC1RAB9ASMN1; SMN2NOTUMATAD2 | |
| SCHEMBL195959 | 0.79 | ALDH1A1 (0.58) | NPC1RAB9ASMN1; SMN2NOTUMALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 397 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0137228-B1 | PHOTOPOLYMERIZABLE COMPOSITION | FUJI PHOTO FILM CO., LTD. (JP) | 1988-10-05 | — | — | EP | claimed |
| EP-0137228-A2 | Photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1985-04-17 | — | — | EP | claimed |
| CN-116615332-B | Optically anisotropic laminate and optical element | MITSUBISHI CHEMICAL CORP. (JP) | 2026-05-26 | — | — | CN | disclosed |
| CN-119948372-A | Optically anisotropic laminate and optical element | 三菱化学株式会社 | 2025-05-06 | — | — | CN | disclosed |
| WO-2024071162-A1 | OPTICALLY ANISOTROPIC LAMINATE AND OPTICAL ELEMENT | 三菱ケミカル株式会社 | 2024-04-04 | — | — | WO | disclosed |
| CN-116615332-A | Optically anisotropic laminate and optical element | 三菱化学株式会社 | 2023-08-18 | — | — | CN | disclosed |
| EP-3392292-B1 | METHOD FOR PRODUCING HETEROCYCLE-CONTAINING POLYMER PRECURSOR, HETEROCYCLE-CONTAINING POLYMER PRECURSOR, AND USE FOR SAME | FUJIFILM CORP (JP) | 2023-06-28 | — | — | EP | disclosed |
| CN-109313397-B | Method for manufacturing laminate, method for manufacturing semiconductor element, and laminate | 富士胶片株式会社 | 2023-04-11 | — | — | CN | disclosed |
| EP-3162868-B1 | THERMAL BASE GENERATOR, THERMOSETTING RESIN COMPOSITION, CURED FILM, CURED FILM MANUFACTURING METHOD, AND SEMICONDUCTOR DEVICE | FUJIFILM CORP (JP) | 2022-10-05 | — | — | EP | disclosed |
| CN-108700836-B | Method for manufacturing laminate and method for manufacturing semiconductor device | 富士胶片株式会社 | 2022-06-28 | — | — | CN | disclosed |
| WO-2022114100-A1 | OPTICALLY ANISOTROPIC LAMINATE AND OPTICAL ELEMENT | 三菱ケミカル株式会社 | 2022-06-02 | — | — | WO | disclosed |
| US-5030548-A | Photoiniator system comprising a 4,4'-bis(dialkylamino) benzophenone, an aromatic ketone and lophine dimer; also present a halogen compound leuco and dye; lithography; printing plates; photoresists | FUJI PHOTO FILM CO., LTD. (JP) | 1991-07-09 | — | — | US | disclosed |
| US-4950582-A | CONTAINING POLYURETHANE CONTAINING N-AMINOSULFONYLAMIDO GROUP | FUJI PHOTO FILM CO., LTD. (JP) | 1990-08-21 | — | — | US | disclosed |
| US-4877711-A | DURABLE PRINTING PLATES | FUJI PHOTO FILM CO., LTD. (JP) | 1989-10-31 | — | — | US | disclosed |
| US-4840869-A | 2-HALOMETHYL-1,3,4-OXADIAZOLE COMPOUNDS | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1989-06-20 | — | — | US | disclosed |
| EP-0118766-B1 | LIGHT-SENSITIVE COMPOSITION | KONICA CORPORATION (JP) | 1989-01-04 | — | — | EP | disclosed |
| US-4661434-A | PHOTORESISTS | FUJI PHOTO FILM CO., LTD. (JP) | 1987-04-28 | — | — | US | disclosed |
| US-4657942-A | LITHOGRAPHIC PRINTING PLATES, RESIN LETTERPRESS, RESISTS, 2-MERCAPTO-1,3,4-TIADIAZOLE FOR INCREASED SENSITIVITY | FUJI PHOTO FILM CO., LTD. (JP) | 1987-04-14 | — | — | US | disclosed |
| US-4584260-A | 4,41-BIS(DIALKYLAMINO)BENZOPHENONE A BENZOPHENONE, 1,3,4-OXADIAZOLE COMPOUND, AROMATIC HALOGENATED SULFONE, QUINAZOLINE AND TRIAZINE COMPOUND | FUJI PHOTO FILM CO., LTD. (JP) | 1986-04-22 | — | — | US | disclosed |
| EP-0137228-A2 | Photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1985-04-17 | — | — | EP | disclosed |