⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6659257 | 0.79 | — | — | |
| SCHEMBL21811939 | 0.78 | — | — | |
| SCHEMBL9441757 | 0.75 | GPR84 (0.50) | — | |
| SCHEMBL14302594 | 0.74 | — | — | |
| SCHEMBL13978556 | 0.74 | CACNA2D1 (0.50) | — | |
| SCHEMBL5487808 | 0.74 | — | — | |
| SCHEMBL276400 | 0.73 | — | — | |
| SCHEMBL18625746 | 0.72 | — | — | |
| SCHEMBL3390147 | 0.72 | — | — | |
| SCHEMBL27553623 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114105926-A | Synthesis method of deuterium-labeled delta-nonalactone | 上海化工研究院有限公司 | 2022-03-01 | — | — | CN | claimed |
| US-11958802-B2 | Migration-resistant photopolymerization sensitizer | KAWASAKI KASEI CHEMICALS LTD. (JP) | 2024-04-16 | — | — | US | disclosed |
| US-20220106254-A1 | MIGRATION-RESISTANT PHOTOPOLYMERIZATION SENSITIZER | KAWASAKI KASEI CHEMICALS LTD. (JP) | 2022-04-07 | — | — | US | disclosed |
| CN-114105926-A | Synthesis method of deuterium-labeled delta-nonalactone | 上海化工研究院有限公司 | 2022-03-01 | — | — | CN | disclosed |
| CN-113166036-A | Photopolymerisable sensitizers having migration resistance | 川崎化成工业株式会社 | 2021-07-23 | — | — | CN | disclosed |
| WO-2020121544-A1 | MIGRATION-RESISTANT PHOTOPOLYMERIZATION SENSITIZER | 川崎化成工業株式会社 | 2020-06-18 | — | — | WO | disclosed |
| WO-2020121384-A1 | PHOTOPOLYMERIZATION SENSITIZER HAVING MIGRATION RESISTANCE | 川崎化成工業株式会社 | 2020-06-18 | — | — | WO | disclosed |
| WO-2020054874-A1 | PHOTOPOLYMERIZATION SENSITIZER | 川崎化成工業株式会社 | 2020-03-19 | — | — | WO | disclosed |
| WO-2020054116-A1 | PHOTOPOLYMERIZATION SENSITIZER | 川崎化成工業株式会社 | 2020-03-19 | — | — | WO | disclosed |
| EP-0491538-A1 | Stereocontrolled production of hydroxyester, hydroxyamide, and lactone compounds from chiral alpha-amino aldehydes | MERCK & CO. INC. (US) | 1992-06-24 | — | — | EP | disclosed |
| US-4069232-A | Manufacture of gamma-butyrolactones from 1,3-glycols and esters, halides and metadioxanes thereof | NATIONAL DISTILLERS AND CHEMICAL CORPORATION (US) | 1978-01-17 | — | — | US | disclosed |