⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14972607 | 0.75 | — | — | |
| SCHEMBL21950148 | 0.73 | — | — | |
| SCHEMBL8187101 | 0.73 | — | — | |
| SCHEMBL25069525 | 0.72 | — | — | |
| SCHEMBL13396214 | 0.72 | — | — | |
| SCHEMBL25475320 | 0.70 | MC4R (0.32) | — | |
| SCHEMBL22667642 | 0.70 | MC4R (0.32) | — | |
| SCHEMBL24896181 | 0.70 | MC4R (0.32) | — | |
| SCHEMBL21699924 | 0.70 | MC4R (0.32) | — | |
| SCHEMBL18473955 | 0.70 | MC4R (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12630661-B2 | Additives useful in 3D printing technologies | Evonik Operations GmbII (DE) | 2026-05-19 | — | — | US | claimed |
| CN-115960328-A | Additives for 3D printing techniques | 赢创运营有限公司 | 2023-04-14 | — | — | CN | claimed |
| US-5173516-A | Having the acid-blocked blowing catalyst at a higher concentration than the gelling catalyst | AIR PRODUCTS AND CHEMICALS, INC. (US) | 1992-12-22 | — | — | US | claimed |
| CN-115960328-A | Additives for 3D printing techniques | 赢创运营有限公司 | 2023-04-14 | — | — | CN | disclosed |
| US-5173516-A | Having the acid-blocked blowing catalyst at a higher concentration than the gelling catalyst | AIR PRODUCTS AND CHEMICALS, INC. (US) | 1992-12-22 | — | — | US | disclosed |