Cinnamic Acid

Cinnamic Acid

SCHEMBL9703248

CCN(C)C.O=C(O)/C=C/c1ccccc1

nearest known ligand 0.70

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HCAR2 Q8TDS4 2/20 0.70
HDAC3 O15379 1/20 0.70
TNKS O95271 1/20 0.70
HDAC4 P56524 1/20 0.70
HDAC1 Q13547 1/20 0.70
HDAC7 Q8WUI4 1/20 0.70
HDAC2 Q92769 1/20 0.70
HDAC10 Q969S8 1/20 0.70
HDAC11 Q96DB2 1/20 0.70
HDAC8 Q9BY41 1/20 0.70
TNKS2 Q9H2K2 1/20 0.70
HDAC6 Q9UBN7 1/20 0.70
HDAC9 Q9UKV0 1/20 0.70
HDAC5 Q9UQL6 1/20 0.70
NPC1 O15118 2/20 0.64
L3MBTL1 Q9Y468 1/20 0.64
GLA P06280 1/20 0.55
TDP1 Q9NUW8 1/20 0.55
ESR1 P03372 5/20 0.54
ESR2 Q92731 4/20 0.54

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Cinnamic Acid SCHEMBL9703252 1.00 HCAR2 (0.70) HCAR2HDAC3TNKSHDAC4HDAC1
Juarezic Acid SCHEMBL28864496 0.88 NPC1 (0.54) HCAR2HDAC3TNKSHDAC4HDAC1
Cinnamic Acid SCHEMBL8020839 0.86 HCAR2 (0.79) HCAR2HDAC3TNKSHDAC4HDAC1
Cinnamic Acid SCHEMBL29193622 0.86 HCAR2 (0.79) HCAR2HDAC3TNKSHDAC4HDAC1
Cinnamic Acid SCHEMBL4613502 0.86 HDAC3 (0.79) HCAR2HDAC3TNKSHDAC4HDAC1
Cinnamic Acid SCHEMBL28228133 0.86 HCAR2 (0.66) HCAR2HDAC3TNKSHDAC4HDAC1
Cinnamic Acid SCHEMBL29010568 0.85 HCAR2 (0.76) HCAR2HDAC3TNKSHDAC4HDAC1
Cinnamic Acid SCHEMBL15169790 0.84 HCAR2 (0.91) HCAR2HDAC3TNKSHDAC4HDAC1
Cinnamic Acid SCHEMBL10881703 0.84 HCAR2 (0.91) HCAR2HDAC3TNKSHDAC4HDAC1
Cinnamic Acid SCHEMBL653828 0.84 HCAR2 (1.00) HCAR2HDAC3TNKSHDAC4HDAC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0504759-A1 Photoresist pattern-forming process suitable for integrated circuit production EASTMAN KODAK COMPANY (US) 1992-09-23 EP disclosed