Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.54 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | TP53 | P04637 | 1/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | CTSL | P07711 | 1/20 | 0.30 |
| ▸ | CTSB | P07858 | 1/20 | 0.30 |
| ▸ | CTSK | P43235 | 1/20 | 0.30 |
| ▸ | THRB | P10828 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4950381 | 0.87 | ALDH1A1 (0.44) | ALDH1A1TSHRCTSLCTSBCTSK | |
| SCHEMBL27503520 | 0.84 | ALDH1A1 (0.56) | ALDH1A1TSHRTP53CYP3A4THRB | |
| SCHEMBL28287889 | 0.83 | ALDH1A1 (0.54) | ALDH1A1TSHRTP53CYP3A4THRB | |
| SCHEMBL8393350 | 0.83 | ALDH1A1 (0.42) | ALDH1A1TSHRTHRB | |
| SCHEMBL18885451 | 0.82 | TSHR (0.44) | ALDH1A1TSHRTP53CYP3A4CTSL | |
| SCHEMBL27786768 | 0.81 | ALDH1A1 (0.57) | ALDH1A1TSHRTP53CYP3A4 | |
| SCHEMBL1144249 | 0.80 | ALDH1A1 (0.60) | ALDH1A1TSHRTP53CYP3A4 | |
| SCHEMBL4241788 | 0.80 | ALDH1A1 (0.51) | ALDH1A1TSHRTP53CYP3A4THRB | |
| SCHEMBL4566336 | 0.79 | ALDH1A1 (0.50) | ALDH1A1TSHR | |
| SCHEMBL10542039 | 0.79 | ALDH1A1 (0.39) | ALDH1A1CTSLCTSBCTSK |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 48 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7611826-B2 | Photosensitive resin composition controlling solubility and pattern formation method of double-layer structure using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-11-03 | — | — | US | claimed |
| US-20090191484-A1 | PHOTOSENSITIVE RESIN COMPOSITION CONTROLLING SOLUBILITY AND PATTERN FORMATION METHOD OF DOUBLE-LAYER STRUCTURE USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-07-30 | — | — | US | claimed |
| CN-100354661-C | Photosensitive resin compsn. controlling solubility and pattern formation method of double-layer structure using same | SAMSUNG ELECTRONICS CO LTD (KR) | 2007-12-12 | — | — | CN | claimed |
| EP-0964878-A4 | HYDROLYTICALLY STABLE RESINS FOR USE IN ANION-EXCHANGE CHROMATOGRAPHY | DIONEX CORP (US) | 2004-12-22 | — | — | EP | claimed |
| CN-1519592-A | Photosensitive resin compsn. controlling solubility and pattern formation method of double-layer structure using same | 三星电子株式会社 | 2004-08-11 | — | — | CN | claimed |
| US-20040115558-A1 | Photosensitive resin composition controlling solubility and pattern formation method of double-layer structure using the same | DONGJIM SEMICHEM CO., LTD. (KR) | 2004-06-17 | — | — | US | claimed |
| EP-0964878-A1 | HYDROLYTICALLY STABLE RESINS FOR USE IN ANION-EXCHANGE CHROMATOGRAPHY | DIONEX CORPORATION (US) | 1999-12-22 | — | — | EP | claimed |
| WO-1998039367-A1 | HYDROLYTICALLY STABLE RESINS FOR USE IN ANION-EXCHANGE CHROMATOGRAPHY | DIONEX CORPORATION (US) | 1998-09-11 | — | — | WO | claimed |
| EP-4727905-A1 | COMPOSITIONS FOR CONSTRUCTION PURPOSES | BASF SE (DE) | 2026-04-22 | — | — | EP | disclosed |
| EP-4587247-A1 | METHOD FOR PRODUCING AQUEOUS POLYMER DISPERSIONS FROM ORGANIC WASTE MATERIALS | BASF SE (DE) | 2025-07-23 | — | — | EP | disclosed |
| US-12285704-B2 | Sulfonamide based anion exchange resins | DIONEX CORPORATION (US) | 2025-04-29 | — | — | US | disclosed |
| WO-2025078362-A1 | PROCESS FOR THE MANUFACTURE OF STYRENE ACRYLIC COPOLYMERS HAVING A RENEWABLY-SOURCED CARBON CONTENT | BASF SE (DE) | 2025-04-17 | — | — | WO | disclosed |
| EP-4532441-A1 | COMPOSITION FOR WATERPROOFING MEMBRANES | BASF SE (DE) | 2025-04-09 | — | — | EP | disclosed |
| WO-2024256160-A1 | COMPOSITIONS FOR CONSTRUCTION PURPOSES | BASF SE (DE) | 2024-12-19 | — | — | WO | disclosed |
| US-5936003-A | RESIN SUPPORT PARTICLES AND ANION EXCHANGE COMPOUNDS ATTACHED WHEREIN THE ANION-EXCHANGE COMPOUNDS COMPRISE AN INTERNAL REACTIVE GROUP, WHICH MAY BE AN ESTER, KETONE OR AMIDE GROUP, AND A TERMINAL QUATERNARY AMMONIUM SALT WHICH FUNCTIONS AS AN | DIONEX CORPORATION (US) | 1999-08-10 | — | — | US | disclosed |
| US-5925253-A | SYNTHETIC RESIN STATIONARY PHASE LINKED TO QUATERNIZED ANION-EXCHANGE SITES THROUGH REACTIVE GROUP AND ELONGATED LINKING ATOM CHAIN | DIONEX CORPORATION (US) | 1999-07-20 | — | — | US | disclosed |
| WO-1998039367-A1 | HYDROLYTICALLY STABLE RESINS FOR USE IN ANION-EXCHANGE CHROMATOGRAPHY | DIONEX CORPORATION (US) | 1998-09-11 | — | — | WO | disclosed |
| EP-0429672-B1 | ACETAL COPOLYMER AND METHOD OF PRODUCING THE SAME | ASAHI CHEMICAL IND (JP) | 1996-03-27 | — | — | EP | disclosed |
| US-5306769-A | Graft copolymerization with particulate crosslinked vinyl monomer units | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1994-04-26 | — | — | US | disclosed |
| EP-0429672-A1 | ACETAL COPOLYMER AND METHOD OF PRODUCING THE SAME | Asahi Kasei Kogyo Kabushiki Kaisha (JP) | 1991-06-05 | — | — | EP | disclosed |