Known targets — ChEMBL curated mechanism
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
The experimentally established mechanism targets of Sulfuric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11147195 | 0.84 | — | — | |
| SCHEMBL11419490 | 0.83 | — | — | |
| Sulfuric Acid SCHEMBL9725585 | 0.83 | MEN1 (0.30) | — | |
| Sulfuric Acid SCHEMBL9170625 | 0.76 | TSHR (0.39) | — | |
| Sulfuric Acid SCHEMBL3902325 | 0.74 | — | — | |
| SCHEMBL9638261 | 0.71 | — | — | |
| SCHEMBL9725567 | 0.70 | — | — | |
| Sulfuric Acid SCHEMBL28447459 | 0.69 | — | — | |
| Hydrochloric Acid SCHEMBL28682434 | 0.69 | — | — | |
| Sulfuric Acid SCHEMBL28613267 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4273842-A | Process for forming patternwise coated powder layer | HITACHI, LTD. (JP) | 1981-06-16 | — | — | US | claimed |
| EP-3992254-B1 | COMPOSITION, FILM, AND OPTICAL SENSOR | FUJIFILM CORP (JP) | 2024-02-21 | — | — | EP | disclosed |
| EP-4310556-A1 | FILM AND PHOTOSENSOR | FUJIFILM Corporation (JP) | 2024-01-24 | — | — | EP | disclosed |
| EP-4130147-A1 | COMPOSITION, FILM, AND OPTICAL SENSOR | FUJIFILM Corporation (JP) | 2023-02-08 | — | — | EP | disclosed |
| WO-2022196599-A1 | FILM AND PHOTOSENSOR | 富士フイルム株式会社 | 2022-09-22 | — | — | WO | disclosed |
| CN-114450098-A | Method for manufacturing heat conductive layer, method for manufacturing laminate, and method for manufacturing semiconductor device | 富士胶片株式会社 | 2022-05-06 | — | — | CN | disclosed |
| EP-3992254-A1 | COMPOSITION, FILM, AND OPTICAL SENSOR | FUJIFILM Corporation (JP) | 2022-05-04 | — | — | EP | disclosed |
| WO-2019203178-A1 | HEAT-CONDUCTING LAYER, PHOTOSENSITIVE LAYER, PHOTOSENSITIVE COMPOSITION, METHOD FOR PRODUCING HEAT-CONDUCTING LAYER, AND LAMINATE AND SEMICONDUCTOR DEVICE | 富士フイルム株式会社 | 2019-10-24 | — | — | WO | disclosed |
| US-5173382-A | Mixture of water soluble polyvinyl alcohol, gelatin and gum arabic and a an aroamtic diazonium chromate | HITACHI, LTD. (JP) | 1992-12-22 | — | — | US | disclosed |
| US-4273842-A | Process for forming patternwise coated powder layer | HITACHI, LTD. (JP) | 1981-06-16 | — | — | US | disclosed |