Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 1/20 | 0.36 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.36 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.36 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.36 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.36 |
| ▸ | MEN1 | O00255 | 2/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.36 |
| ▸ | NPC1 | O15118 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.32 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
| ▸ | SCN9A | Q15858 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL668486 | 0.98 | CYP1A2 (0.37) | CYP1A2CYP2D6CYP2C9CYP2C19HIF1A | |
| SCHEMBL973686 | 0.88 | MEN1 (0.33) | CYP1A2CYP2D6CYP2C9CYP2C19HIF1A | |
| SCHEMBL23641340 | 0.83 | CYP1A2 (0.31) | CYP1A2CYP2D6CYP2C9CYP2C19HIF1A | |
| SCHEMBL12256435 | 0.83 | MEN1 (0.37) | CYP1A2CYP2D6CYP2C9CYP2C19HIF1A | |
| SCHEMBL18785775 | 0.82 | CYP1A2 (0.35) | CYP1A2CYP2D6CYP2C9CYP2C19HIF1A | |
| SCHEMBL18785293 | 0.82 | CYP1A2 (0.35) | CYP1A2CYP2D6CYP2C9CYP2C19HIF1A | |
| SCHEMBL13259885 | 0.82 | CYP1A2 (0.35) | CYP1A2CYP2D6CYP2C9CYP2C19HIF1A | |
| SCHEMBL12307786 | 0.82 | CYP1A2 (0.35) | CYP1A2CYP2D6CYP2C9CYP2C19HIF1A | |
| SCHEMBL2536302 | 0.81 | MEN1 (0.35) | CYP1A2CYP2D6CYP2C9CYP2C19HIF1A | |
| SCHEMBL14607359 | 0.81 | MEN1 (0.37) | CYP1A2CYP2D6CYP2C9CYP2C19HIF1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8043786-B2 | Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions | JSR CORPORATION (JP) | 2011-10-25 | — | — | US | disclosed |
| US-7871761-B2 | Resist lower layer material, resist lower layer substrate comprising the material and method for forming pattern | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-01-18 | — | — | US | disclosed |
| US-20080032231-A1 | Resist lower layer material, resist lower layer substrate comprising the material and method for forming pattern | SHIN-ETSU CHEMICAL CO., LTD. | 2008-02-07 | — | — | US | disclosed |
| US-20070054214-A1 | Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions | JSR CORPORATION (JP) | 2007-03-08 | — | — | US | disclosed |
| EP-1600437-A1 | ACID GENERATORS, SULFONIC ACIDS, SULFONYL HALIDES, AND RADIATION-SENSITIVE RESIN COMPOSITIONS | JSR Corporation (JP) | 2005-11-30 | — | — | EP | disclosed |