Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 1/20 | 0.37 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.37 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.37 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.37 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.37 |
| ▸ | MEN1 | O00255 | 2/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.36 |
| ▸ | NPC1 | O15118 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.32 |
| ▸ | SCN9A | Q15858 | 1/20 | 0.31 |
| ▸ | P2RX7 | Q99572 | 1/20 | 0.30 |
| ▸ | HPGD | P15428 | 1/20 | 0.30 |
| ▸ | PER2 | O15055 | 1/20 | 0.30 |
| ▸ | CRY1 | Q16526 | 1/20 | 0.30 |
| ▸ | CRY2 | Q49AN0 | 1/20 | 0.30 |
| ▸ | MEP1B | Q16820 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL974339 | 0.98 | CYP1A2 (0.36) | CYP1A2CYP2D6CYP2C9CYP2C19HIF1A | |
| SCHEMBL973686 | 0.90 | MEN1 (0.33) | CYP1A2CYP2D6CYP2C9CYP2C19HIF1A | |
| SCHEMBL23641340 | 0.84 | CYP1A2 (0.31) | CYP1A2CYP2D6CYP2C9CYP2C19HIF1A | |
| SCHEMBL12307786 | 0.83 | CYP1A2 (0.35) | CYP1A2CYP2D6CYP2C9CYP2C19HIF1A | |
| SCHEMBL18785293 | 0.83 | CYP1A2 (0.35) | CYP1A2CYP2D6CYP2C9CYP2C19HIF1A | |
| SCHEMBL13259885 | 0.83 | CYP1A2 (0.35) | CYP1A2CYP2D6CYP2C9CYP2C19HIF1A | |
| SCHEMBL18785775 | 0.83 | CYP1A2 (0.35) | CYP1A2CYP2D6CYP2C9CYP2C19HIF1A | |
| SCHEMBL2536302 | 0.83 | MEN1 (0.35) | CYP1A2CYP2D6CYP2C9CYP2C19HIF1A | |
| SCHEMBL14607359 | 0.83 | MEN1 (0.37) | CYP1A2CYP2D6CYP2C9CYP2C19HIF1A | |
| SCHEMBL26190636 | 0.82 | MEN1 (0.35) | HSD17B10MEN1KMT2ANPC1RAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 425 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118511127-A | Photosensitive resin composition, method for producing resist pattern film, and method for producing plating molded article | JSR株式会社 | 2024-08-16 | — | — | CN | disclosed |
| US-12032288-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2024-07-09 | — | — | US | disclosed |
| US-11835849-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2023-12-05 | — | — | US | disclosed |
| US-20230341772-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | JSR CORPORATION (JP) | 2023-10-26 | — | — | US | disclosed |
| US-20230341772-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | JSR CORPORATION (JP) | 2023-10-26 | — | — | US | disclosed |
| WO-2023189503-A1 | RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND PHOTODEGRADABLE BASE | JSR株式会社 | 2023-10-05 | — | — | WO | disclosed |
| US-20230280652-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING MONOMERIC COMPOUND | JSR CORPORATION (JP) | 2023-09-07 | — | — | US | disclosed |
| US-11747725-B2 | Radiation-sensitive resin composition and method for forming resist pattern | JSR CORPORATION (JP) | 2023-09-05 | — | — | US | disclosed |
| US-11747725-B2 | Radiation-sensitive resin composition and method for forming resist pattern | JSR CORPORATION (JP) | 2023-09-05 | — | — | US | disclosed |
| WO-2023157801-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN FILM, AND METHOD FOR PRODUCING PLATED SHAPED ARTICLE | JSR株式会社 | 2023-08-24 | — | — | WO | disclosed |
| US-7297461-B2 | Radiation sensitive resin composition | JSR CORPORATION (JP) | 2007-11-20 | — | — | US | disclosed |
| US-7288359-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2007-10-30 | — | — | US | disclosed |
| US-20070099113-A1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-03 | — | — | US | disclosed |
| US-20070099112-A1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-03 | — | — | US | disclosed |
| US-20060234153-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-10-19 | — | — | US | disclosed |
| US-20060228648-A1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2006-10-12 | — | — | US | disclosed |
| EP-1710230-A1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2006-10-11 | — | — | EP | disclosed |
| EP-1557718-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2005-07-27 | — | — | EP | disclosed |
| JP-2004307387-A | 2-(BICYCLO[2.2.1]HEPT-2-YL)-1,1-DIFLUOROETHYLSULFINATE OR 2-(BICYCLO[2.2.1]HEPT-2-YL)-1,1-DIFLUOROETHYLSULFONATE AND METHOD FOR PRODUCING THEM | TOSOH F-TECH INC | 2004-11-04 | — | — | JP | disclosed |
| JP-2004307387-A | 2-(BICYCLO[2.2.1]HEPT-2-YL)-1,1-DIFLUOROETHYLSULFINATE OR 2-(BICYCLO[2.2.1]HEPT-2-YL)-1,1-DIFLUOROETHYLSULFONATE AND METHOD FOR PRODUCING THEM | TOSOH F-TECH INC | 2004-11-04 | — | — | JP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230341772-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | RER1, XRCC5, F12 | CYP1A2 1790/4885CYP2D6 3495/4885CYP2C9 3604/4885 |
| US-11747725-B2 | Radiation-sensitive resin composition and method for forming resist pattern | RER1, AFF1, RAD51 | CYP1A2 879/4885CYP2D6 2404/4885CYP2C9 2715/4885 |
| US-11835849-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | RER1, TERB1, TRRAP | CYP1A2 3952/4885CYP2D6 3872/4885CYP2C9 3647/4885 |
| US-12032288-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | RER1, COL1A1, RAD51 | CYP1A2 1460/4885CYP2D6 2212/4885CYP2C9 2762/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.