SCHEMBL9746642

SCHEMBL9746642

NC(=O)Cc1cc2ccccc2c2ccccc12

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 2/20 0.44
POLB P06746 1/20 0.44
PKM P14618 1/20 0.44
RAD52 P43351 1/20 0.44
TAAR1 Q96RJ0 1/20 0.44
TRPM4 Q8TD43 1/20 0.44
CYP1A2 P05177 3/20 0.43
PLA2G10 O15496 2/20 0.43
ALDH1A1 P00352 6/20 0.42
KDM4E B2RXH2 4/20 0.42
MEN1 O00255 3/20 0.42
KMT2A Q03164 3/20 0.42
CYP2C19 P33261 2/20 0.42
CYP3A4 P08684 1/20 0.42
CYP2D6 P10635 1/20 0.42
CYP2C9 P11712 1/20 0.42
ALOX12 P18054 1/20 0.42
SMN1; SMN2 Q16637 1/20 0.42
FAAH O00519 1/20 0.42
TDP1 Q9NUW8 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4086110 0.83 CYP1A2 (0.43) MAPTPOLBPKMRAD52TAAR1
SCHEMBL9711246 0.81 TRPM4 (0.44) MAPTPOLBPKMRAD52TAAR1
SCHEMBL12800027 0.77 KDM4E (0.46) MAPTCYP1A2ALDH1A1KDM4ECYP2C19
SCHEMBL66670 0.77 TDP1 (0.69) MAPTPKMCYP1A2MEN1KMT2A
SCHEMBL615452 0.76 TRPM4 (0.54) MAPTPOLBPKMRAD52TAAR1
SCHEMBL9711249 0.76 TRPM4 (0.45) MAPTPOLBPKMRAD52TAAR1
SCHEMBL27634399 0.76 TDP1 (0.67) MAPTPKMALDH1A1MEN1KMT2A
Hydrochloric Acid SCHEMBL7517236 0.76 TDP1 (0.67) MAPTPKMALDH1A1MEN1KMT2A
SCHEMBL28754118 0.76 TDP1 (0.67) MAPTPKMALDH1A1MEN1KMT2A
SCHEMBL31484059 0.75 KDM4E (0.54) MAPTCYP1A2PLA2G10ALDH1A1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5100762-A Radiation-sensitive polymer and radiation-sensitive composition containing the same MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 1992-03-31 US claimed
US-5100762-A Radiation-sensitive polymer and radiation-sensitive composition containing the same MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 1992-03-31 US disclosed