SCHEMBL9749889

SCHEMBL9749889

N=C(S)NCCO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL10944341 0.97
SCHEMBL4093703 0.73 MEN1 (0.39)
SCHEMBL1054328 0.73
SCHEMBL9191057 0.73
SCHEMBL9076215 0.73
SCHEMBL31404266 0.71
Bromide SCHEMBL9435928 0.71
Hydrochloric Acid SCHEMBL10656294 0.71
Hydrochloric Acid SCHEMBL7527399 0.71
SCHEMBL7175840 0.69 DNM1 (0.43)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109161935-B Manufacturing process of one-step molding hollow hard gold watchcase 福州珂麦表业有限公司 2020-05-26 CN claimed
CN-112239875-A Method for improving electroforming gold current efficiency 深圳市黄金谷金业有限公司 2021-01-19 CN disclosed
CN-109161935-B Manufacturing process of one-step molding hollow hard gold watchcase 福州珂麦表业有限公司 2020-05-26 CN disclosed
EP-0210660-B1 IMAGE FORMING PROCESS FUJI PHOTO FILM CO., LTD. (JP) 1992-05-27 EP disclosed
EP-0143310-B1 COLOR LIGHT-SENSITIVE MATERIAL FUJI PHOTO FILM CO., LTD. (JP) 1988-08-24 EP disclosed
US-4695525-A HEAT DEVELOPMENT, PYRAZOLONE FUJI PHOTO FILM CO., LTD. (JP) 1987-09-22 US disclosed
US-4668612-A Heat-developable color photosensitive material FUJI PHOTO FILM CO., LTD. (JP) 1987-05-26 US disclosed
US-4463079-A Heat developable color photographic materials with redox dye releasers FUJI PHOTO FILM CO., LTD. (JP) 1984-07-31 US disclosed