⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12980186 | 1.00 | — | — | |
| SCHEMBL17385701 | 1.00 | — | — | |
| SCHEMBL17385642 | 1.00 | — | — | |
| SCHEMBL17385702 | 1.00 | — | — | |
| SCHEMBL12979369 | 1.00 | — | — | |
| SCHEMBL977268 | 0.97 | — | — | |
| SCHEMBL133500 | 0.88 | — | — | |
| SCHEMBL12980060 | 0.81 | — | — | |
| SCHEMBL130105 | 0.74 | — | — | |
| SCHEMBL31164821 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 99 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240199553-A1 | DIFLUOROMETHYLATION REACTION OF HETEROCYCLIC RING USING TETRAFLUOROETHYLENE | AGC Inc. (JP) | 2024-06-20 | — | — | US | disclosed |
| EP-4385977-A1 | DIFLUOROMETHYLATION REACTION OF HETEROCYCLIC RING USING TETRAFLUOROETHYLENE | AGC INC. (JP) | 2024-06-19 | — | — | EP | disclosed |
| WO-2024116575-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, AND RADIATION-SENSITIVE ACID GENERATOR | JSR株式会社 | 2024-06-06 | — | — | WO | disclosed |
| WO-2024116576-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND RADIATION-SENSITIVE ACID-GENERATING AGENT | JSR株式会社 | 2024-06-06 | — | — | WO | disclosed |
| WO-2024116577-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND RADIATION-SENSITIVE ACID GENERATOR | JSR株式会社 | 2024-06-06 | — | — | WO | disclosed |
| WO-2024106020-A1 | RADIATION SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2024-05-23 | — | — | WO | disclosed |
| WO-2024105962-A1 | RADIOACTIVE-RAY-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2024-05-23 | — | — | WO | disclosed |
| WO-2024090041-A1 | RADIOACTIVE-RAY-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2024-05-02 | — | — | WO | disclosed |
| US-20240142876-A1 | SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND COMPOSITION | JSR CORPORATION (JP) | 2024-05-02 | — | — | US | disclosed |
| US-11966160-B2 | Radiation-sensitive resin composition and method for forming pattern | JSR CORPORATION (JP) | 2024-04-23 | — | — | US | disclosed |
| WO-2010034531-A1 | PHOTOCURABLE COMPOSITION | HUNTSMAN ADVANCED MATERIALS (SWITZERLAND) GMBH (CH) | 2010-04-01 | — | — | WO | disclosed |
| EP-2168994-A1 | Photocurable composition | Huntsman Advanced Materials (Switzerland) GmbH (CH) | 2010-03-31 | — | — | EP | disclosed |
| WO-2010018008-A1 | THERMOSETTING COMPOSITION | HUNTSMAN ADVANCED MATERIALS (SWITZERLAND) GMBH (CH) | 2010-02-18 | — | — | WO | disclosed |
| EP-1957459-A2 | IMINOPROPENE COMPOUND AND USE THEREOF | Sumitomo Chemical Company, Limited (JP) | 2008-08-20 | — | — | EP | disclosed |
| US-20080103139-A1 | 3-Carbamoyl-2-Pyridone Derivative | SHIONOGI & CO. LTD. (JP) | 2008-05-01 | — | — | US | disclosed |
| EP-1806342-A1 | 3-CARBAMOYL-2-PYRIDONE DERIVATIVE | SHIONOGI & CO., LTD. (JP) | 2007-07-11 | — | — | EP | disclosed |
| WO-2007063702-A2 | IMINOPROPENE COMPOUND AND USE THEREOF | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-06-07 | — | — | WO | disclosed |
| WO-1998043649-A2 | AGE PRODUCTION INHIBITORY COMPOSITION COMPRISING A MAILLARD REACTION INHIBITOR AND VITAMIN B¿6? | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 1998-10-08 | — | — | WO | disclosed |
| US-5422360-A | Hydrazonoimidazolidin-4-one derivatives; treatment of diabetes and aging disorders | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 1995-06-06 | — | — | US | disclosed |
| EP-0531812-A1 | Maillard reaction inhibitor, process for producing it, composition containing it and the use thereof | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 1993-03-17 | — | — | EP | disclosed |