SCHEMBL975134

SCHEMBL975134

CCCCC[Si](Cl)(Cl)c1ccccc1

nearest known ligand 0.40

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
KCNH2 Q12809 1/20 0.39
CYP19A1 P11511 3/20 0.37
NAAA Q02083 1/20 0.37
SIGMAR1 Q99720 1/20 0.36
LTA4H P09960 1/20 0.36
TSHR P16473 1/20 0.35
CES2 O00748 1/20 0.35
CES1 P23141 1/20 0.35
DNM1 Q05193 1/20 0.35
EPHX1 P07099 3/20 0.35
EPHX2 P34913 1/20 0.35
ALDH1A1 P00352 1/20 0.35
HTT P42858 1/20 0.35
KCNH3 Q9ULD8 1/20 0.35
GPR84 Q9NQS5 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18107979 0.98 KCNH2 (0.42) KCNH2CYP19A1NAAADNM1EPHX1
SCHEMBL29199583 0.98 KCNH2 (0.42) KCNH2CYP19A1NAAADNM1EPHX1
SCHEMBL20483303 0.98 KCNH2 (0.42) KCNH2CYP19A1NAAADNM1EPHX1
SCHEMBL19470858 0.98 KCNH2 (0.42) KCNH2CYP19A1NAAADNM1EPHX1
SCHEMBL19470853 0.98 KCNH2 (0.42) KCNH2CYP19A1NAAADNM1EPHX1
SCHEMBL19470813 0.98 KCNH2 (0.42) KCNH2CYP19A1NAAADNM1EPHX1
SCHEMBL2101335 0.98 KCNH2 (0.42) KCNH2CYP19A1NAAADNM1EPHX1
SCHEMBL20483516 0.98 KCNH2 (0.42) KCNH2CYP19A1NAAADNM1EPHX1
SCHEMBL29199607 0.98 KCNH2 (0.42) KCNH2CYP19A1NAAADNM1EPHX1
SCHEMBL707927 0.94 TSHR (0.36) CYP19A1NAAASIGMAR1LTA4HTSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10066059-B2 Sealing material composition for LED NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2018-09-04 US disclosed
CN-102898655-B Method for preparing optically active polysilane UNIV HANGZHOU NORMAL 2014-06-25 CN disclosed
US-8709697-B2 Method of manufacturing toner RICOH COMPANY, LTD. (JP) 2014-04-29 US disclosed
US-8445172-B2 Method for producing toner and toner RICOH COMPANY, LTD. (JP) 2013-05-21 US disclosed
CN-102898655-A Method for preparing optically active polysilane UNIV HANGZHOU NORMAL 2013-01-30 CN disclosed
US-20110014565-A1 METHOD OF MANUFACTURING TONER RICOH COMPANY, LTD (JP) 2011-01-20 US disclosed
US-20100227267-A1 METHOD FOR PRODUCING TONER AND TONER RICOH COMPANY, LTD. (JP) 2010-09-09 US disclosed