⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7694325 | 0.90 | — | — | |
| SCHEMBL7695861 | 0.90 | — | — | |
| SCHEMBL23908715 | 0.80 | — | — | |
| Cyclopentene SCHEMBL135360 | 0.78 | — | — | |
| SCHEMBL6862235 | 0.73 | — | — | |
| SCHEMBL6862177 | 0.70 | — | — | |
| Cyclohexene SCHEMBL64924 | 0.67 | — | — | |
| SCHEMBL974360 | 0.67 | — | — | |
| SCHEMBL23908695 | 0.67 | — | — | |
| SCHEMBL7689963 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9719018-B2 | Monomer, liquid crystal composition, liquid crystal display device, and production method for liquid crystal display device | SHARP KABUSHIKI KAISHA (JP) | 2017-08-01 | — | — | US | claimed |
| US-11326024-B2 | Polyamide resin, molded body, laminate, medical device, and polyamide resin production method | KANEKA CORPORATION (JP) | 2022-05-10 | — | — | US | disclosed |
| US-20210277183-A1 | POLYAMIDE RESIN, MOLDED BODY, LAMINATE, MEDICAL DEVICE, AND POLYAMIDE RESIN PRODUCTION METHOD | KANEKA CORPORATION (JP) | 2021-09-09 | — | — | US | disclosed |
| US-9719018-B2 | Monomer, liquid crystal composition, liquid crystal display device, and production method for liquid crystal display device | SHARP KABUSHIKI KAISHA (JP) | 2017-08-01 | — | — | US | disclosed |
| US-9597306-B1 | Fumarate compounds, pharmaceutical compositions thereof, and methods of use | Nguyen, Mark Quang (US) | 2017-03-21 | — | — | US | disclosed |
| US-20170056358-A1 | FUMARATE COMPOUNDS, PHARMACEUTICAL COMPOSITIONS THEREOF, AND METHODS OF USE | Nguyen, Mark Quang (US) | 2017-03-02 | — | — | US | disclosed |
| WO-2017023445-A1 | FUMARATE COMPOUNDS, PHARMACEUTICAL COMPOSITIONS THEREOF, AND METHODS OF USE | NGUYEN MARK QUANG (US) | 2017-02-09 | — | — | WO | disclosed |
| US-20170027898-A1 | FUMARATE COMPOUNDS, PHARMACEUTICAL COMPOSITIONS THEREOF, AND METHODS OF USE | NGUYEN MARK QUANG (US) | 2017-02-02 | — | — | US | disclosed |
| US-9532968-B1 | Fumarate compounds, pharmaceutical compositions thereof, and methods of use | Nguyen, Mark Quang (US) | 2017-01-03 | — | — | US | disclosed |
| US-9403784-B1 | Fumarate compounds, pharmaceutical compositions thereof, and methods of use | Nguyen, Mark Quang (US) | 2016-08-02 | — | — | US | disclosed |
| WO-2009120434-A1 | SILICONE COMPOSITION AND ORGANIC LIGHT-EMITTING DIODE | DOW CORNING CORPORATION (US) | 2009-10-01 | — | — | WO | disclosed |
| US-20090137774-A1 | ADAMANTANE DERIVATIVE, RESIN COMPOSITION CONTAINING SAME, AND OPTOELECTRONIC COMPONENT USING SAME | IDEMITSU KOSAN CO., LTD. (JP) | 2009-05-28 | — | — | US | disclosed |
| EP-1930327-A1 | ADAMANTANE DERIVATIVE, RESIN COMPOSITION CONTAINING SAME, AND OPTOELECTRONIC COMPONENT USING SAME | IDEMITSU KOSAN CO., LTD. (JP) | 2008-06-11 | — | — | EP | disclosed |
| US-7141352-B2 | Basic compound, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-11-28 | — | — | US | disclosed |
| US-20050008968-A1 | Basic compound, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-01-13 | — | — | US | disclosed |
| US-6794530-B1 | 1,4-ADDITION OF MONOHYDRIC OR POLYHYDRIC ALCOHOLS TO ALPHA , BETA -UNSATURATED NITRILES | BASF AKTIENGESELLSCHAFT (DE) | 2004-09-21 | — | — | US | disclosed |
| EP-0934925-B1 | Process for the preparation of beta-alkoxy nitriles | BASF AG (DE) | 2002-09-25 | — | — | EP | disclosed |
| US-6335143-B1 | Resist composition containing specific cross-linking agent | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2002-01-01 | — | — | US | disclosed |
| EP-0934925-A1 | Process for the preparation of beta-alkoxy nitriles | BASF AKTIENGESELLSCHAFT (DE) | 1999-08-11 | — | — | EP | disclosed |
| EP-0887706-A1 | Resist composition containing specific cross-linking agent | WAKO PURE CHEMICAL INDUSTRIES, LTD (JP) | 1998-12-30 | — | — | EP | disclosed |