Ammonia Solution, Strong

Ammonia Solution, Strong

SCHEMBL9756324

CCCC(C)(C)O.N

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7754200 0.96 ALDH1A1 (0.64)
SCHEMBL12496 0.96
SCHEMBL27386232 0.93
SCHEMBL27974495 0.93
SCHEMBL27974692 0.93
Hydrogen Peroxide SCHEMBL28379737 0.93
SCHEMBL8759308 0.93
SCHEMBL27389533 0.93
SCHEMBL27388912 0.93
SCHEMBL27981924 0.93

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107427758-A Utilize the separation of ion liquid solvent 切弗朗菲利浦化学公司 2017-12-01 CN claimed
EP-3507346-B1 ALKYLATION OF REFINERY PENTENES WITH ISOBUTANE CHEVRON USA INC (US) 2025-04-30 EP disclosed
CN-109844069-A Utilize isobutane alkylation oil plant amylene 雪佛龙美国公司 2019-06-04 CN disclosed
CN-109642165-A Integrated coalescing system for separating liquid hydrocarbons from dispersed ionic liquid 雪佛龙美国公司 2019-04-16 CN disclosed
CN-108982403-A Integrated system and method for online monitoring of chemical concentration in ionic liquid 雪佛龙美国公司 2018-12-11 CN disclosed
CN-108473880-A Regeneration of acidic ionic liquid without adding hydrogenation catalyst 雪佛龙美国公司 2018-08-31 CN disclosed
CN-108014660-A It is continuously injected into the integrated system of a small amount of immiscible liquids 雪佛龙美国公司 2018-05-11 CN disclosed
CN-107427758-A Utilize the separation of ion liquid solvent 切弗朗菲利浦化学公司 2017-12-01 CN disclosed
EP-0237997-B1 THERMOSETTING RESINS AND ELECTRODEPOSITION COATING COMPOSITIONS CONTAINING THE SAME Takeda Chemical Industries, Ltd. (JP) 1991-07-24 EP disclosed
US-4748200-A Thermosetting resins and electrodeposition coating compositions containing the same TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) 1988-05-31 US disclosed
EP-0237997-A1 Thermosetting resins and electrodeposition coating compositions containing the same Takeda Chemical Industries, Ltd. (JP) 1987-09-23 EP disclosed