Betaine

Betaine

SCHEMBL9760152

CC(C[n+]1ccccc1)S(=O)(=O)O.C[N+](C)(C)CC(=O)O

nearest known ligand 0.42

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

BHMTBHMT2

The experimentally established mechanism targets of Betaine. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.42
ALDH1A1 P00352 1/20 0.41
LMNA P02545 1/20 0.41
APEX1 P27695 1/20 0.41
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Betaine SCHEMBL9761399 0.80 TSHR (0.38) TSHRALDH1A1LMNAAPEX1
Betaine SCHEMBL2129189 0.79 TSHR (0.40) TSHRALDH1A1LMNAAPEX1
Betaine SCHEMBL7554854 0.78 TSHR (0.45) TSHRALDH1A1LMNAAPEX1
Betaine SCHEMBL7046211 0.75 TSHR (0.45) TSHRALDH1A1LMNAAPEX1KMT2A
Betaine SCHEMBL3642873 0.73 TSHR (0.56) TSHRALDH1A1LMNAAPEX1KMT2A
Betaine SCHEMBL1628919 0.73 TSHR (0.42) TSHRALDH1A1LMNAAPEX1
Betaine SCHEMBL7550058 0.73 TSHR (0.42) TSHRALDH1A1LMNAAPEX1
Betaine SCHEMBL3179196 0.70 TSHR (0.52) TSHRALDH1A1LMNAAPEX1KMT2A
Betaine SCHEMBL11143345 0.67 TSHR (0.47) TSHRALDH1A1LMNAAPEX1KMT2A
Betaine SCHEMBL1072056 0.66 TSHR (0.70) TSHRALDH1A1LMNAAPEX1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5024736-A Process for electroplating utilizing disubstituted ethane sulfonic compounds as electroplating auxiliaries and electroplating auxiliaries containing same RASCHIG AG (DE) 1991-06-18 US disclosed