SCHEMBL976219

SCHEMBL976219

COc1cc([N+](=O)[O-])cc2c1OC1(C=C2)N(C)c2ccccc2C1(C)C

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 10/20 0.50
MEN1 O00255 5/20 0.50
KMT2A Q03164 5/20 0.50
LMNA P02545 5/20 0.50
GAA P10253 4/20 0.50
RECQL P46063 3/20 0.50
TDP1 Q9NUW8 3/20 0.50
NPSR1 Q6W5P4 2/20 0.50
ALPG P10696 1/20 0.50
TP53 P04637 1/20 0.50
ALOX15 P16050 1/20 0.50
HSD17B10 Q99714 1/20 0.50
GFER P55789 1/20 0.46
SMN1; SMN2 Q16637 6/20 0.42
THRB P10828 4/20 0.42
PKM P14618 2/20 0.42
PLIN1 O60240 1/20 0.42
TSHR P16473 1/20 0.42
PLIN5 Q00G26 1/20 0.42
ABHD5 Q8WTS1 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30612732 1.00 MAPT (0.50) MAPTMEN1KMT2ALMNAGAA
SCHEMBL29473569 1.00 MAPT (0.50) MAPTMEN1KMT2ALMNAGAA
SCHEMBL13326515 1.00 MAPT (0.50) MAPTMEN1KMT2ALMNAGAA
SCHEMBL3287910 0.93 MAPT (0.43) MAPTMEN1KMT2ALMNAGAA
SCHEMBL3287913 0.93 MAPT (0.43) MAPTMEN1KMT2ALMNAGAA
SCHEMBL11788015 0.90 KMT2A (0.57) MAPTMEN1KMT2ALMNAGAA
SCHEMBL30612721 0.90 KMT2A (0.57) MAPTMEN1KMT2ALMNAGAA
SCHEMBL30612701 0.89 MAPT (0.48) MAPTMEN1KMT2ALMNAGAA
SCHEMBL8680346 0.89 MAPT (0.39) MAPTMEN1KMT2ALMNAGAA
SCHEMBL6140122 0.89 MAPT (0.48) MAPTMEN1KMT2ALMNAGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 110 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11359136-B2 Colorimetric indicators for photocurable sealants THE BOEING COMPANY (US) 2022-06-14 US claimed
EP-3619919-B1 WEARABLE DEVICES WITH INCREASED ADHESION BOSE CORP (US) 2022-01-12 EP claimed
US-10715904-B2 Wearable devices with increased adhesion BOSE CORPORATION (US) 2020-07-14 US claimed
US-10583666-B2 Ink composition DOMINO UK LIMITED (GB) 2020-03-10 US claimed
US-20200059716-A1 WEARABLE DEVICES WITH INCREASED ADHESION BANK OF AMERICA, N.A., AS ADMINISTRATIVE AGENT 2020-02-20 US claimed
US-10506326-B2 Wearable devices with increased adhesion BOSE CORPORATION (US) 2019-12-10 US claimed
US-20180376236-A1 WEARABLE DEVICES WITH INCREASED ADHESION BANK OF AMERICA, N.A., AS ADMINISTRATIVE AGENT 2018-12-27 US claimed
US-9857882-B2 Pointing display device DONGWOO FINE-CHEM CO., LTD. (KR) 2018-01-02 US claimed
US-20170260412-A1 INK COMPOSITION DOMINO UK LIMITED (GB) 2017-09-14 US claimed
US-20070202290-A1 DATA-PROTECTED DIGITAL RECORDING MEDIA VERIFICATION TECHNOLOGIES, INC. (US) 2007-08-30 US claimed
US-5759729-A A DRY TONER COMPRISING A RESIN, PHOTOCHROMATIC SPIROPYRAN, -OXAZINE OR -THIOPYRAN DYE AND A CHARGE CONTROL AGENT;ELECTROGRAPHY; XEROGRAPHY XEROX CORPORATION (US) 1998-06-02 US claimed
US-4225661-A DIAZO RESIN LAYER, PHOTOCHROMIC DYE AND ADDITION POLYMER OVERLAYER THE RICHARDSON COMPANY (US) 1980-09-30 US claimed
US-12233173-B2 Light-coupling cap sterilization system UV LIGHT CARE, INC. (US) 2025-02-25 US disclosed
US-20240199911-A1 HYBRID DUAL CURE COMPOSITIONS PRC-DESOTO INTERNATIONAL, INC. (US) 2024-06-20 US disclosed
US-20240132752-A1 COMPOSITIONS CONTAINING A FREE RADICAL POLYMERIZATION INITIATOR PRC-DESOTO INTERNATIONAL, INC. (US) 2024-04-25 US disclosed
EP-4314115-A1 HYBRID DUAL CURE COMPOSITIONS PRC-Desoto International, Inc. (US) 2024-02-07 EP disclosed
US-4444869-A INCORPORATING A PHOTOCHROMIC SPIROPYRAN COMPOUND FUJITSU LIMITED (JP) 1984-04-24 US disclosed
EP-0024916-B1 IMPROVED POSITIVE-WORKING RESIST MATERIALS AND THEIR USE IN A FORMATION OF A NEGATIVE RESIST PATTERN ON A SUBSTRATE FUJITSU LIMITED (JP) 1984-03-28 EP disclosed
EP-0024916-A2 Improved positive-working resist materials and their use in a formation of a negative resist pattern on a substrate FUJITSU LIMITED (JP) 1981-03-11 EP disclosed
US-3933509-A Photo-polymerizable composition containing an acid salt of an indolinobenzospiropyran FUJI PHOTO FILM CO., LTD. (JA) 1976-01-20 US disclosed