SCHEMBL9767720

SCHEMBL9767720

C=CC(=O)OCCCCCCCCCCCCCCCCOC(=O)c1cc(C(=O)O)c(C(=O)O)cc1C(=O)OCCCCCCCCCCCCCCCCOC(=O)C=C

nearest known ligand 0.59

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
TSHR P16473 7/20 0.59
ALDH1A1 P00352 4/20 0.59
CYP3A4 P08684 2/20 0.59
HPGD P15428 1/20 0.46
THRB P10828 1/20 0.43
TP53 P04637 3/20 0.42
HIF1A Q16665 2/20 0.42
HSD17B10 Q99714 1/20 0.42
LMNA P02545 1/20 0.41
TDP1 Q9NUW8 1/20 0.39
MAPK1 P28482 1/20 0.38
HTT P42858 1/20 0.38
KMT2A Q03164 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10892751 0.92 TSHR (0.50) TSHRALDH1A1CYP3A4HPGDTHRB
SCHEMBL12386663 0.92 TSHR (0.50) TSHRALDH1A1CYP3A4HPGDTHRB
SCHEMBL10890546 0.92 TSHR (0.50) TSHRALDH1A1CYP3A4HPGDTHRB
SCHEMBL29377132 0.87 TSHR (0.51) TSHRALDH1A1CYP3A4HPGDTHRB
SCHEMBL21496304 0.87 TSHR (0.51) TSHRALDH1A1CYP3A4HPGDTHRB
SCHEMBL29752018 0.87 TSHR (0.51) TSHRALDH1A1CYP3A4HPGDTHRB
SCHEMBL29376233 0.85 TSHR (0.49) TSHRALDH1A1CYP3A4HPGDTHRB
SCHEMBL5269420 0.85 TSHR (0.49) TSHRALDH1A1CYP3A4HPGDTHRB
SCHEMBL12430619 0.85 THRB (0.44) TSHRALDH1A1CYP3A4HPGDTHRB
SCHEMBL19201285 0.85 THRB (0.44) TSHRALDH1A1CYP3A4HPGDTHRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0452986-A2 Photosensitive amphiphilic high molecular weight polymers and process for their production KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1991-10-23 EP disclosed
US-5043248-A Photosensitive thin films KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1991-08-27 US disclosed
EP-0262446-A2 Photosensitive amphiphilic high polymers and process for their production KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1988-04-06 EP disclosed