Hydroquinone

Hydroquinone

SCHEMBL9768877

CCCCCCCCCc1ccccc1O.Oc1ccc(O)cc1

nearest known ligand 0.66

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 3/20 0.66
TYR P14679 3/20 0.66
MAPT P10636 3/20 0.66
TP53 P04637 2/20 0.66
ALOX15 P16050 2/20 0.66
MEN1 O00255 1/20 0.66
ALOX5 P09917 1/20 0.66
TSHR P16473 1/20 0.66
HTT P42858 1/20 0.66
KMT2A Q03164 1/20 0.66
TDP1 Q9NUW8 1/20 0.66
KDM4E B2RXH2 3/20 0.58
HSD17B10 Q99714 3/20 0.58
ESR1 P03372 2/20 0.58
ADRA2A P08913 2/20 0.58
ADORA3 P0DMS8 2/20 0.58
TACR2 P21452 2/20 0.58
SLC6A2 P23975 2/20 0.58
SLC6A4 P31645 2/20 0.58
SLC6A3 Q01959 2/20 0.58

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Phenol SCHEMBL2961601 0.95 BID (0.59) CYP3A4TYRMAPTTP53ALOX15
Phenol SCHEMBL11032832 0.95 BID (0.59) CYP3A4TYRMAPTTP53ALOX15
Phenol SCHEMBL9509568 0.95 BID (0.59) CYP3A4TYRMAPTTP53ALOX15
Phenol SCHEMBL2205139 0.95 BID (0.59) CYP3A4TYRMAPTTP53ALOX15
Phenol SCHEMBL970202 0.95 BID (0.59) CYP3A4TYRMAPTTP53ALOX15
Phenol SCHEMBL8395143 0.95 BID (0.59) CYP3A4TYRMAPTTP53ALOX15
SCHEMBL273583 0.94 LIPG (0.63) CYP3A4TYRMAPTTP53ALOX15
SCHEMBL157630 0.94 LIPG (0.63) CYP3A4TYRMAPTTP53ALOX15
SCHEMBL2922317 0.94 LIPG (0.63) CYP3A4TYRMAPTTP53ALOX15
SCHEMBL9321974 0.94 LIPG (0.63) CYP3A4TYRMAPTTP53ALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5063135-A Including a novolak phenolic resin interlayer; antisoilants; antifogging agents; thin film strength; high speed completion time; adhesion FUJI PHOTO FILM CO., LTD. (JP) 1991-11-05 US disclosed