⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5408564 | 0.81 | — | — | |
| SCHEMBL5419402 | 0.80 | — | — | |
| SCHEMBL26623950 | 0.78 | — | — | |
| SCHEMBL27813317 | 0.78 | — | — | |
| SCHEMBL3616781 | 0.78 | — | — | |
| SCHEMBL5415608 | 0.78 | — | — | |
| SCHEMBL331418 | 0.76 | — | — | |
| SCHEMBL978794 | 0.75 | — | — | |
| SCHEMBL5415594 | 0.73 | — | — | |
| SCHEMBL19511924 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 209 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250304819-A1 | Flexible and foldable abrasion resistant photopatternable siloxane hard coat | OPTITUNE OY (FI) | 2025-10-02 | — | — | US | claimed |
| CN-107636097-B | Silicone polymer composition and use thereof | 奥普提汀公司 | 2024-03-15 | — | — | CN | claimed |
| US-11634610-B2 | Siloxane polymer compositions and their use | OPTITUNE OY (FI) | 2023-04-25 | — | — | US | claimed |
| US-20220010172-A1 | SILOXANE POLYMER COMPOSITIONS AND THEIR USE | OPTITUNE OY (FI) | 2022-01-13 | — | — | US | claimed |
| US-11127864-B2 | Carbosiloxane polymer compositions, methods of producing the same and the use thereof | OPTITUNE OY (FI) | 2021-09-21 | — | — | US | claimed |
| CN-107636844-B | Composition, device containing the composition, method for manufacturing the same, and method for improving battery efficiency | 欧提腾股份有限公司 | 2021-05-28 | — | — | CN | claimed |
| US-20210087429-A1 | Flexible and foldable abrasion resistant photopatternable siloxane hard coat | OPTITUNE OY (FI) | 2021-03-25 | — | — | US | claimed |
| EP-3775075-A1 | FLEXIBLE AND FOLDABLE ABRASION RESISTANT PHOTOPATTERNABLE SILOXANE HARD COAT | Optitune Oy (FI) | 2021-02-17 | — | — | EP | claimed |
| CN-112236493-A | Flexible and foldable abrasion resistant photopatternable silicone hardcoats | 欧提腾股份有限公司 | 2021-01-15 | — | — | CN | claimed |
| WO-2019193258-A1 | FLEXIBLE AND FOLDABLE ABRASION RESISTANT PHOTOPATTERNABLE SILOXANE HARD COAT | OPTITUNE OY (FI) | 2019-10-10 | — | — | WO | claimed |
| US-20180066159-A1 | SILOXANE POLYMER COMPOSITIONS AND THEIR USE | BASF SE (DE) | 2018-03-08 | — | — | US | claimed |
| EP-3271756-A2 | NOVEL CARBOSILOXANE POLYMER COMPOSITIONS, METHODS OF PRODUCING THE SAME AND THE USE THEREOF | Optitune Oy (FI) | 2018-01-24 | — | — | EP | claimed |
| EP-3271433-A1 | NOVEL SILOXANE POLYMER COMPOSITIONS AND THEIR USE | BASF SE (DE) | 2018-01-24 | — | — | EP | claimed |
| WO-2016146896-A1 | NOVEL SILOXANE POLYMER COMPOSITIONS AND THEIR USE | OPTITUNE OY (FI) | 2016-09-22 | — | — | WO | claimed |
| US-7932295-B2 | Organic silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR CORPORATION (JP) | 2011-04-26 | — | — | US | claimed |
| US-7875317-B2 | formed by hydrolyzing and condensing a siloxy compound in the presence of a polycarbosilane; low relative dielectric constant and excellent mechanical strength, storage stability, and chemical resistance; semiconductors | JSR CORPORATION (JP) | 2011-01-25 | — | — | US | claimed |
| US-20080246153-A1 | ORGANIC SILICA-BASED FILM, METHOD OF FORMING THE SAME, COMPOSITION FOR FORMING INSULATING FILM FOR SEMICONDUCTOR DEVICE, INTERCONNECT STRUCTURE, AND SEMICONDUCTOR DEVICE | JSR CORPORATION (JP) | 2008-10-09 | — | — | US | claimed |
| US-7399715-B2 | Organic silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR CORPORATION (JP) | 2008-07-15 | — | — | US | claimed |
| EP-4624479-A1 | HYDROSILANE COMPOSITION AND METHOD FOR PREPARING HYDROSILYLATION PRODUCT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-10-01 | — | — | EP | disclosed |
| EP-1088868-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-04 | — | — | EP | disclosed |