⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL704741 | 0.87 | — | — | |
| SCHEMBL646422 | 0.87 | — | — | |
| SCHEMBL537847 | 0.84 | — | — | |
| SCHEMBL1920971 | 0.84 | — | — | |
| SCHEMBL17373020 | 0.84 | — | — | |
| SCHEMBL6034392 | 0.84 | THRB (0.35) | — | |
| SCHEMBL23521398 | 0.82 | — | — | |
| SCHEMBL643396 | 0.82 | — | — | |
| SCHEMBL31634000 | 0.82 | — | — | |
| SCHEMBL57613 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 356 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250304819-A1 | Flexible and foldable abrasion resistant photopatternable siloxane hard coat | OPTITUNE OY (FI) | 2025-10-02 | — | — | US | claimed |
| CN-107636097-B | Silicone polymer composition and use thereof | 奥普提汀公司 | 2024-03-15 | — | — | CN | claimed |
| US-11634610-B2 | Siloxane polymer compositions and their use | OPTITUNE OY (FI) | 2023-04-25 | — | — | US | claimed |
| US-20220010172-A1 | SILOXANE POLYMER COMPOSITIONS AND THEIR USE | OPTITUNE OY (FI) | 2022-01-13 | — | — | US | claimed |
| US-11127864-B2 | Carbosiloxane polymer compositions, methods of producing the same and the use thereof | OPTITUNE OY (FI) | 2021-09-21 | — | — | US | claimed |
| US-20210087429-A1 | Flexible and foldable abrasion resistant photopatternable siloxane hard coat | OPTITUNE OY (FI) | 2021-03-25 | — | — | US | claimed |
| EP-2993687-B1 | METHOD FOR PROVIDING PORE SEALING LAYER ON POROUS LOW DIELECTRIC CONSTANT FILMS | VERSUM MAT US LLC (US) | 2020-02-05 | — | — | EP | claimed |
| US-20180277691-A1 | Novel carbosiloxane polymer compositions, methods of producing the same and the use thereof | OPTITUNE OY (FI) | 2018-09-27 | — | — | US | claimed |
| US-20180066159-A1 | SILOXANE POLYMER COMPOSITIONS AND THEIR USE | BASF SE (DE) | 2018-03-08 | — | — | US | claimed |
| US-9809711-B2 | Catalyst and formulations comprising same for alkoxysilanes hydrolysis reaction in semiconductor process | VERSUM MATERIALS US, LLC (US) | 2017-11-07 | — | — | US | claimed |
| EP-2993687-A1 | METHOD AND COMPOSITION FOR PROVIDING PORE SEALING LAYER ON POROUS LOW DIELECTRIC CONSTANT FILMS | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-03-09 | — | — | EP | claimed |
| US-20160049293-A1 | METHOD AND COMPOSITION FOR PROVIDING PORE SEALING LAYER ON POROUS LOW DIELECTRIC CONSTANT FILMS | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-02-18 | — | — | US | claimed |
| EP-2618364-A2 | Catalyst and formulations comprising same for alkoxysilanes hydrolysis reaction in semiconductor process | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-07-24 | — | — | EP | claimed |
| US-20130180215-A1 | CATALYST AND FORMULATIONS COMPRISING SAME FOR ALKOXYSILANES HYDROLYSIS REACTION IN SEMICONDUCTOR PROCESS | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-07-18 | — | — | US | claimed |
| US-7932295-B2 | Organic silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR CORPORATION (JP) | 2011-04-26 | — | — | US | claimed |
| US-7875317-B2 | formed by hydrolyzing and condensing a siloxy compound in the presence of a polycarbosilane; low relative dielectric constant and excellent mechanical strength, storage stability, and chemical resistance; semiconductors | JSR CORPORATION (JP) | 2011-01-25 | — | — | US | claimed |
| US-20080246153-A1 | ORGANIC SILICA-BASED FILM, METHOD OF FORMING THE SAME, COMPOSITION FOR FORMING INSULATING FILM FOR SEMICONDUCTOR DEVICE, INTERCONNECT STRUCTURE, AND SEMICONDUCTOR DEVICE | JSR CORPORATION (JP) | 2008-10-09 | — | — | US | claimed |
| US-7399715-B2 | Organic silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR CORPORATION (JP) | 2008-07-15 | — | — | US | claimed |
| US-20250304819-A1 | Flexible and foldable abrasion resistant photopatternable siloxane hard coat | OPTITUNE OY (FI) | 2025-10-02 | — | — | US | disclosed |
| US-4931362-A | Microcapsule and micromatrix bodies and method for their formation | F.JOH.KWIZDA GESELLSCHAFT M.B.H. (AT) | 1990-06-05 | — | — | US | disclosed |