SCHEMBL9770770

SCHEMBL9770770

CCCCCCC(=O)CC(=O)C(F)(F)F

nearest known ligand 0.70

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
FAAH O00519 14/20 0.70
CES1 P23141 9/20 0.70
CES2 O00748 4/20 0.70
MEN1 O00255 1/20 0.70
CYP1A2 P05177 1/20 0.70
KMT2A Q03164 1/20 0.70
HSD17B10 Q99714 1/20 0.70
HAO1 Q9UJM8 1/20 0.55

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11211125 1.00 FAAH (0.70) FAAHCES1CES2MEN1CYP1A2
SCHEMBL11214076 1.00 FAAH (0.70) FAAHCES1CES2MEN1CYP1A2
SCHEMBL20905096 1.00 FAAH (0.70) FAAHCES1CES2MEN1CYP1A2
SCHEMBL5466926 1.00 FAAH (0.70) FAAHCES1CES2MEN1CYP1A2
SCHEMBL18319323 1.00 FAAH (0.70) FAAHCES1CES2MEN1CYP1A2
SCHEMBL11218026 1.00 FAAH (0.70) FAAHCES1CES2MEN1CYP1A2
SCHEMBL1347562 0.98 FAAH (0.69) FAAHCES1CES2MEN1CYP1A2
SCHEMBL7252679 0.92 FAAH (0.59) FAAHCES1CES2MEN1CYP1A2
SCHEMBL9566446 0.89 FAAH (0.52) FAAHCES1CES2MEN1CYP1A2
SCHEMBL10339402 0.89 FAAH (0.52) FAAHCES1CES2MEN1CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10695723-B2 Dye sensitized photoactive surfaces MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2020-06-30 US disclosed
US-10023752-B2 Conductive material and substrate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-07-17 US disclosed
US-20170130070-A1 CONDUCTIVE MATERIAL AND SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-05-11 US disclosed
US-20170130071-A1 CONDUCTIVE MATERIAL AND SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-05-11 US disclosed
US-20160367946-A1 DYE SENSITIZED PHOTOACTIVE SURFACES MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2016-12-22 US disclosed
US-9360753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-07 US disclosed
US-9091914-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-07-28 US disclosed
US-20130029270-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-01-31 US disclosed
US-20120208125-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-08-16 US disclosed
CN-1819275-A Transparent electrode having thermal stability, method of fabricating the same and dye-sensitized solar cell comprising the same SAMSUNG SDI CO LTD (KR) 2006-08-16 CN disclosed
US-5006254-A Extraction with halogenated beta-diketone RHONE-POULENC CHIMIE (FR) 1991-04-09 US disclosed
US-4322441-A Use of fluorinated beta-diketones as bacteriocides and fungicides MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1982-03-30 US disclosed
US-4320149-A Use of fluorinated beta-diketones as antiplaque agents MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1982-03-16 US disclosed