SCHEMBL977299

SCHEMBL977299

CCCN(CO)CO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL976758 0.93
SCHEMBL94543 0.87
SCHEMBL2057860 0.84
SCHEMBL7964014 0.82 CA12 (0.41)
Alcohol SCHEMBL13280379 0.81 TSHR (0.46)
SCHEMBL976730 0.80
SCHEMBL18432801 0.80
Alcohol SCHEMBL11583547 0.79 TSHR (0.43)
Ethylene Glycol SCHEMBL15066021 0.79 CA12 (0.39)
Propanol SCHEMBL11766477 0.79 CA12 (0.39)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 145 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2928992-B1 ADDITIVE COMPOSITIONS AND INDUSTRIAL PROCESS FLUIDS FUCHS PETROLUB SE (DE) 2018-08-01 EP claimed
US-9587197-B2 Additive compositions and industrial process fluids FUCHS PETROLUB SE (DE) 2017-03-07 US claimed
US-20160201000-A1 ADDITIVE COMPOSITIONS AND INDUSTRIAL PROCESS FLUIDS FUCHS PETROLUB SE (DE) 2016-07-14 US claimed
EP-2928992-A1 ADDITIVE COMPOSITIONS AND INDUSTRIAL PROCESS FLUIDS Fuchs Petrolub SE (DE) 2015-10-14 EP claimed
WO-2015116233-A1 ADDITIVE COMPOSITIONS AND INDUSTRIAL PROCESS FLUIDS FUCHS PETROLUB SE (DE) 2015-08-06 WO claimed
US-7968507-B2 Composition for stripping and stripping method SAMSUNG ELECTRONICS CO., LTD. (KR) 2011-06-28 US claimed
US-20090084406-A1 Composition for stripping and stripping method SAMSUNG ELECTRONICS CO., LTD. 2009-04-02 US claimed
US-20080066644-A1 Alkylmines, alkanolamine compounds, surfactants, a coloring agent and a solvent; combination results in decreased kogation SAMSUNG ELECTRONICS CO., LTD. (KR) 2008-03-20 US claimed
EP-1900785-A1 Ink Composition for Inkjet Recording Samsung Electronics Co., Ltd. (KR) 2008-03-19 EP claimed
US-4759861-A Consists of an aliphatic mono- or di-carboxylic acid, a dimer or trimer of said dicarboxylic acid, petroleum sulfonic acid and naphthenic acid or salt NIPPON OIL CO., LTD. (JP) 1988-07-26 US claimed
CN-120037400-A Cartilage-compatible crosslinked liposome nanoparticle and preparation method and application thereof 北京航空航天大学 2025-05-27 CN disclosed
US-20240294760-A1 Zwitterionic Polysiloxane for Biomedical Devices UNIVERSITY OF PITTSBURGH - OF THE COMMONWEALTH SYSTEM OF HIGHER EDUCATION 2024-09-05 US disclosed
US-12031033-B2 Zwitterionic polysiloxane for biomedical devices University of Pittsburgh—of the Commonwealth System of Higher Education (US) 2024-07-09 US disclosed
CN-109890360-B Methods, compositions and uses related thereto 因诺斯佩克有限公司 2023-11-21 CN disclosed
CN-109789065-B Cosmetic composition for combating colour loss of dyed material 因诺斯佩克有限公司 2023-11-21 CN disclosed
EP-0604958-A2 Polymer finishing process UNION CARBIDE CHEMICALS & PLASTICS TECHNOLOGY CORPORATION (US) 1994-07-06 EP disclosed
US-5324798-A Removal of active polymer residue UNION CARBIDE CHEMICALS & PLASTICS TECHNOLOGY CORPORATION (US) 1994-06-28 US disclosed
US-4759861-A Consists of an aliphatic mono- or di-carboxylic acid, a dimer or trimer of said dicarboxylic acid, petroleum sulfonic acid and naphthenic acid or salt NIPPON OIL CO., LTD. (JP) 1988-07-26 US disclosed
US-4294940-A A CATIONIC POLYMER OF A CONJUGATED DIENE MODIFIED BY AN UNSATURATED ACID OR ANHYDRIDE, ALCOHOL OR AMINE, EPOXY COMPOUND, AND BLOCKED POLYISOCYANATE; AUTO PAINTS SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1981-10-13 US disclosed
US-3933690-A Dihalobutenediol containing urethane foam compositions ICI UNITED STATES INC. (US) 1976-01-20 US disclosed